Chemical composition (at%) of titanium surface after chemical etching and after anodic polarization in a DES bath composed of choline dihydrogencitrate and oxalic acid at 10 and 30 V for 10 min at 60 °Ca.
| Sample | Spectral line and atomic ratio | |||||
|---|---|---|---|---|---|---|
| Ti 2p | O 1s | C 1s | C : Ti | O : Ti | C : O | |
| Etched Ti(as-received) | 24.94 | 47.36 | 27.71 | 1.11 | 1.90 | 0.59 |
| Etched Ti(Ar+) | 39.03 | 58.08 | 2.89 | 0.07 | 1.49 | 0.05 |
| 10 V(as-received) | 22.76 | 56.59 | 20.65 | 0.91 | 2.49 | 0.36 |
| 10 V(Ar+) | 31.45 | 64.9 | 3.65 | 0.12 | 2.06 | 0.06 |
| 30 V(as-received) | 21.73 | 57.63 | 20.63 | 0.95 | 2.65 | 0.36 |
| 30 V(Ar+) | 29.61 | 63.56 | 6.83 | 0.23 | 2.15 | 0.11 |
a
(as-received) – sample without Ar+ sputter cleaning, (Ar+) – surface of the sample was sputter cleaned with Ar+.