Atomic percentages of the surface composition of the Mg2SiO4 samples.
| Sample no. | A% of Mg | A% of Si | A% of O |
|---|---|---|---|
| S1 | 11.30 | 15.45 | 73.25 |
| S2 | 15.28 | 16.24 | 68.47 |
| S3 | 20.53 | 13.60 | 65.87 |
| S4 | 23.02 | 21.18 | 55.81 |
| S5 | 36.73 | 11.55 | 51.71 |
| S6 | 13.46 | 14.85 | 71.69 |
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