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. 2020 Sep 2;8:e00137. doi: 10.1016/j.ohx.2020.e00137

Fig. 21.

Fig. 21

Change in photoresistor measured light intensity over the print duration for each WFS (A is low, B is med, and C is high), the red line is a smoothing formula = y ~ x + log(x), and a 95% confidence is shown in gray.