| Large proportion to volume |
Many substrates of the device have poor solvent-resistance and are not resistant to high temperatures |
| Less sample consumption |
Sensitive to channel blocking, which may also change the mix |
| Effective manipulation of reagents |
Special substrates (such as glass or silica) or molds (Su-8 based) are expensive and include clean room features |
| Adequate mixing, controlled residence time and proper reaction conditions |
Limited in line description techniques |
| The kinetic study is well-controlled due to heat and mass transmission |
Hardening in the line of refining and extraction |
| Synthesis with high efficiency |
Prevention and post-operative work are not fully automated |
| Nanoparticles with adjustable size and smaller size distribution, which results in increased physical/chemical performance |
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| Simple synthesis potential with multi-stage integration in a single chip |
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| Potential for line identification, optimization and feedback control |
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