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. 2022 Apr 29;12:7033. doi: 10.1038/s41598-022-11107-w

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© The Author(s) 2022

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.

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(a–d): The XRD patterns of the grown thin film of In₂S₃ at annealing temperature 550 °C with different pressures (a) 50 Torr (b) 100 Torr (c) 150 Torr, and (d) 200 Torr.