Fig. 18. 3D inscriptions made by free-radical photopolymerization of monomer BisGMA/TEGDMA (50%/50% w/w) mixtures in the presence of a two-component photoinitiating system based on (I) BI-PH-O-CH3 (0.1 wt%) + iodonium salt (1 wt%), (II) BI-PH-CN (0.1 wt%) + EDB (1.5 wt%) at room temperature and under atmospheric conditions. (A) photocurable MWCNT nanocomposites seen in sunlight; (B) photocurable MWCNT nanocomposites seen under excitation 365 nm UV-LED light source.
