Fig. 1. The stability of plasmid DNA, and plasmid DNA/IL nanocomplexes against ultrasonic shear stress was investigated using agarose gel electrophoresis assay. Both the plasmid DNA and plasmid DNA/IL nanocomplexes were subjected to ultrasonic shear stress for different time points. The plasmid DNA was exposed to ultrasonic shear stress for 0, 10, 20, 30, and 40 minutes. However, the plasmid DNA/IL nanocomplexes were exposed to ultrasonic shear stress for 0, 10, 20, 30, 40, 60, 90, and 120 minutes.
