Fig. 1. Schematic illustration of (a) VUV/(O)-modification on COP surface, (b) TMCTS deposition on the modified COP surface, (c) SiO_x thin films formed by VUV/(O)-photo-oxidation, (d) affinity-patterning by VUV/(O)-treatment through a photomask, (e) site-selective deposition of TMCTS on the affinity-patterned COP surface, (f) SiO_x microstructures on the COP substrate.