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. 2018 Mar 5;8(17):9409–9413. doi: 10.1039/c8ra00243f

Fig. 2. (a) Double logarithmic JV curves measured under dark of hole only device based on pristine Spiro-OMeTAD (coded as Spiro), LiTFSI and TBP doped Spiro-OMeTAD (coded as Spiro/Li/TBP) as well as LiTFSI, TBP and FeCl3 doped Spiro-OMeTAD (code as Spiro/Li/TBP/FeCl3). (b) Hole mobility of Spiro-OMeTAD with or without dopants. The thickness of the HTM films is kept the same (80 nm).

Fig. 2