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. 2022 May 12;13:2643. doi: 10.1038/s41467-022-30427-z

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© The Author(s) 2022

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 5 — a Resistance of printed PaLMP according to applied strain. b Resistance of PaLMP under repeated application of 100% strain over 10,000 cycles. c SEM image and EDS mapping of PaLMP after the strain cycles. There is no rupturing in PaLMP, and carbon and surfer contained in PSS are uniformly distributed after the cycling. d Top: photograph of folded PaLMP. Middle left, bottom right: photograph and OM images after unfolding of folded PaLMP, respectively. Bottom left: photograph after unfolding of folded bulk LM. e Top: photograph of stretched PaLMP. Bottom: images of PaLMP (left) and bulk LM (right) after stretching. f Resistance variation of multilayered PaLMP-based interconnects under repeated application of 50% strain. Inset: illustration of end-to-end (left) and parallel (right) electrodes configuration.