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. 2022 May 20;14(5):1097. doi: 10.3390/pharmaceutics14051097

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© 2022 by the authors.

Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).

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Concentration-dependent etching methodology: (A) mask for the boron diffusion, (B) oxide mask stripped succeeding diffusion, (C) mask for the KOH etching, (D) boron-doped structure expelled by the KOH etching [120]. (Reprinted from Ref. [120]).