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Measured atomic surface concentrations of differently treated working electrodes.
| Electrode Preconditioning | C [at. %] |
O [at. %] |
Si [at. %] |
Cl [at. %] |
|---|---|---|---|---|
| None (pristine electrode) | 86.1 | 5.6 | 1.5 | 6.8 |
| H2O2-treated | 86.9 | 5.3 | 0.9 | 6.8 |
| H2SO4-treated | 86.9 | 5.4 | 1.2 | 6.6 |
| Positive-plasma-treated | 83.0 | 10.6 | 1.4 | 5.0 |
| Negative-plasma-treated | 80.7 | 13.3 | 1.9 | 4.0 |
