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Scheme 1. Schematic illustration of the synthesis route employed for the preparation of poly(glycerol monomethacrylate)59-poly(2-hydroxypropyl methacrylate)400 (G59-H400) diblock copolymer vesicles at 10–20% w/w solids via RAFT aqueous dispersion polymerization of HPMA using a G59 precursor, and their subsequent utilization as seed particles for the preparation of G59-H400-Ox triblock copolymer nano-objects at 11–20% w/w solids via RAFT-mediated aqueous polymerization-induced disassembly (PIDA).