Figure 2.

Left panels: T_sub dependences of the film deposition rate (top) and ionic conductivity (bottom). Lines are visual guides. Right panel: T_sub dependence of GIXRD patterns of 2 h-deposited Li₃PO₄ films on stainless steel substrates with an incident angle of 0.25°. A GIXRD pattern from a substrate without Li₃PO₄ deposition is also shown at the bottom. Deposition conditions are as follows: RF power, 150 W; Ar, 20 sccm; O₂, 5 sccm; total pressure, 0.6 Pa; target–substrate distance, 150 mm; and substrate bias potential, +0.5 V.