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. 2022 Jun 8;7(24):21199–21206. doi: 10.1021/acsomega.2c02104

Figure 3.

Figure 3

Left panels: O2 and Ar gas ratio dependences of the film deposition rate (top) and ionic conductivity (bottom). Lines are visual guides. Right panel: the same dependence of GIXRD patterns of 2 h-deposited Li3PO4 films on stainless steel substrates with an incident angle of 0.25°. Deposition conditions are as follows: Tsub, 100 °C; RF power, 150 W; total pressure, 0.6 Pa; target–substrate distance, 150 mm; and substrate bias potential, +0.5 V.