Figure 3.
Left panels: O2 and Ar gas ratio dependences of the film deposition rate (top) and ionic conductivity (bottom). Lines are visual guides. Right panel: the same dependence of GIXRD patterns of 2 h-deposited Li3PO4 films on stainless steel substrates with an incident angle of 0.25°. Deposition conditions are as follows: Tsub, 100 °C; RF power, 150 W; total pressure, 0.6 Pa; target–substrate distance, 150 mm; and substrate bias potential, +0.5 V.
