Figure 4.

Left panels: thickness dependences of the film deposition rate (top) and ionic conductivity (bottom). Lines are visual guides. Right panel: deposited thickness dependence of AC impedance Nyquist plots. Deposition conditions were as follows: T_sub, 100 °C; RF power, 150 W; Ar, 20 sccm; O₂, 1 sccm; total pressure, 0.6 Pa; target–substrate distance, 150 mm; and substrate bias potential, +0.5 V. The AC impedance data were taken in the frequency range of 5 × 10⁵–0.01 Hz with an AC amplitude of 20 mV.