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Illustration of the process flow for the deposition of mesoporous CuTe thin film. A) Di‐block copolymer (BCP) dissolved in tetrahydrofuran (THF) and self‐assembled to form micelles when introduced in deionized water (DIW). B) Electrochemical deposition process for nonporous (without BCP) and mesoporous BCP‐1, BCP‐2 and BCP‐3 films with varying micelle sizes in the electrolyte solution. C) THF‐assisted soft‐template removal to obtain mesoporous films.
