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. 2022 Jul 23;12(15):2537. doi: 10.3390/nano12152537
ANFF Australian National Fabrication Facility
CMOS complementary metal-oxide semiconductor
EBL electron beam lithography
FOM figure of merit
GMR guided mode resonance
MSE mean-squared error
NIR near infrared
PECVD plasma-enhanced chemical vapor deposition
PML perfectly matched layers
SE spectroscopic ellipsometry
SEM scanning electron microscopy
TE transverse electric
TM transverse magnetic
WVASE Woollam variable-angle spectroscopic ellipsometry