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. 2022 Jul 28;12(15):2593. doi: 10.3390/nano12152593

Figure 1.

Figure 1

Contents of elements (a) and residual impurities (b) measured by XRF, constituting the HfO2-Fe2O3 films, expressed in atomic% against relative amount of HfO2 deposition cycles. The elements are indicated in the legends. Polynomial lines are guides for the eye.