Figure 2.

X-ray reflectivity results for selected stacks of Fe₂O₃ and HfO₂ layers grown on Si, denoted by the labels revealing the amounts of ALD cycles used for the deposition of constituent layers. The thicknesses of constituent layers as the results of the curve fittings are also given by labels. The curves with fitting results are presented for the four-layer laminate grown using equal amounts of cycles for both constituent oxides (a), the three-layer laminate grown using equal amounts of cycles for both constituent oxides (b), the double-layer consisting of relatively thicker Fe₂O₃ and thinner HfO₂ films (c), and the four-layer laminate containing Fe₂O₃ layers relatively thicker compared to the HfO₂ component (d).