Fig. 3.
Dependence of H2O2 generation on the surface OH groups on the SiO2 substrate. (A) Fluorescent microscopy images of H2O2 generation on SiO2 substrate with different surface treatments. (B) The corresponding fluorescence intensity profiles of H2O2 generation in (A). (C) Schematic of the O-atom isotope experiment setup. (D) Reaction scheme of H2O2-promoted/H218O2-promoted deborylation of 4-CPB. (E) Mass spectrum analysis of 4-hydroxybenzoic acid on SiO2 substrates treated by O2 and 18O2 plasmas.