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. 2022 Aug 25;12:14549. doi: 10.1038/s41598-022-18554-5

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© The Author(s) 2022, corrected publication 2023

Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.

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Simulated examples of complex particle patterns possible with the presented patterning and clearing techniques. A systematic clearing approach has been applied to the circular particle locations in all figures. (a) has also had custom clearing applied to remove any remaining particles with the final location indicated by the blue crosses. This was primarily achieved using an intermediate impulse vortex trap to move each particle away from the shape, then a standing wave to pull them further away. Note that the particles have been moved away but there is minimal disturbance to the coherence of the pattern. The blue scale bar is 1 mm. See Supplementary Video 5 for animations of these processes.