Fig. 7. Images printed by selectively depositing an additional Si₃N₄ layer using a shadow mask over a uniform Si₃N₄ layer. The “maple leaf” image (t_i) and background (t_b) regions have different Si₃N₄ thicknesses: (a) t_b = 50 nm and t_i = 150 nm; (b) t_b = 100 nm and t_i = 200 nm; (c) t_b = 100 nm and t_i = 300 nm.