Fig. 1. (a) A Schematic diagram of the NP-patterned SiO2/Si substrate and (b) scanning electron microscopy image of the NP region. (c) Optical reflectivity spectra of the patterned substrates fabricated with 100 and 320 nm-SiO2/Si wafers. The spectra of the NP regions – NP(100) and NP(320) – and those of the flat regions – flat(100) and flat(320) – from both substrates can be compared, where the numbers in parentheses indicate the thickness of the SiO2 layers of the non-patterned wafers.
