Table 1.
Symbol | Units | Description | Symbol | Units | Description |
---|---|---|---|---|---|
β | Angstroms−1 | Tunneling constant | Csc | Farads centimeter-2 |
Differential capacitance of the space-charge layer in the semiconductor |
b | — | Css | Farads centimeter-2 | Differential capacitance of surface states | |
d | Centimeters | Length of the tether | Csurf | Farads centimeter-2 | Differential capacitance of the surface layer |
ε 0 | Farads centimeter−1 | Permittivity of free space | Celec | Farads centimeter-2 | Differential capacitance of the electrolyte |
εsc,b | — | Relative dielectric constant of the bulk semiconductor | Cf | Farads centimeter-2 | Differential capacitance of the faradaic reaction |
εsc,scl | — | Relative dielectric constant at the edge of the semiconductor space-charge layer | Eapp | Volts | Applied potential relative to the flat-band potential |
εsurf | — | Relative dielectric constant of the surface layer | Ecb | Volts | Conduction-band potential for the corresponding value of Eapp |
εelec | — | Relative dielectric constant of the electrolyte | Ecb,fb | Volts | Conduction-band potential when Eapp = Efb |
ϕsc,b | Volts | Electrostatic potential in the bulk of the semiconductor | Efb | Volts | Flat-band potential ≡ 0 |
ϕsc,s | Volts | Electrostatic potential at the surface of the semiconductor | E 0 fb | Volts | Standard potential of redox adsorbate when Eapp = Efb |
ϕPET | Volts | Electrostatic potential at the plane of electron transfer | Fs | — | Potential-dependent probability function for the integrated charge across the space-charge layer in the semiconductor |
ϕsol | Volts | Electrostatic potential at the edge of the diffuse layer in solution | fs | — | Potential-dependent probability function for the integrated charge held in surface states |
Γlower(x,y) | — | Lower incomplete Γ function with arguments x and y | j | Amps centimeter−2 | Total measured current density |
Γupper(x,y) | — | Upper incomplete Γ function with arguments x and y | jf | Amps centimeter−2 | Faradaic current density |
κ | Centimeters−1 | Reciprocal thickness of the double layer | jc | Amps centimeter−2 | Charging current density |
σsc,s | Coulombs centimeter−2 | Charge density at the surface of the semiconductor | kf | Seconds−1 | Forward charge-transfer rate constant |
σsc,b | Coulombs centimeter−2 | Charge density in the semiconductor bulk | kb | Seconds−1 | Back charge-transfer rate constant |
σPET | Coulombs centimeter−2 | Charge density at the plane of electron transfer | ket | Centimeters4 second−1 | Electron transfer rate constant from the conduction band |
σelec | Coulombs centimeter−2 | Charge density in the electrolyte | k 0 | Seconds−1 | Heterogeneous rate constant when Eapp = E0 |
σscl | Coulombs centimeter−2 | Charge density stored in the semiconductor space-charge layer | kss | Centimeters3 second−1 | Rate constant for filling/emptying surface states |
σss | Coulombs centimeter−2 | Charge density stored in surface states | m | — | Normalized experimental timescale, |
χA | — | Fraction of oxidized adsorbed redox species | Nd | Centimeters−3 | No. of dopants per unit volume |
χA- | — | Fraction of reduced adsorbed redox species | nelec | Molecules centimeters−3 | Concentration of supporting electrolyte |
γsc | — | Fraction of the time-dependent applied potential dropped across the space-charge layer of the semiconductor | ns, 0 | Centimeters−3 | Majority carrier concentration when Eapp = E0 |
γsurf | — | Fraction of the time-dependent applied potential dropped across the surface layer | Nss | Centimeters−2 | Density of surface states per unit area |
γelec | — | Fraction of the time-dependent applied potential dropped across the electrolyte layer | u | — | Normalized applied potential that directly moves the Fermi level |
[A]s,0 | Molecules centimeter−2 | Total surface concentration of redox species | v | Volts second−1 | Scan rate (+ and − on cathodic and anodic sweeps, respectively) |
q | Coulombs | Unsigned charge of an electron | Centimeters | Potential-dependent width of semiconductor space-charge layer | |
kB | Joules Kelvin−1 | Boltzmann's constant | zA | — | Oxidation state of oxidized form of redox species |
T | Kelvin | Temperature | zA- | — | Oxidation state of reduced form of redox species |
CT | Farads centimeters-2 |
Total measured capacitance of the semiconductor electrode | z | — | Type of electrolyte (=1 for a 1:1 electrolyte) |
Z | — |