Skip to main content
. 2022 Sep 23;8(38):eabn9573. doi: 10.1126/sciadv.abn9573

Fig. 1. The conceptual demonstration of the difference of fabricating diamond nanopillar sensors with or without self-aligned technique.

Fig. 1.

(A) The finite-difference time-domain (FDTD) simulation model (see Materials and Methods). (B) The simulation results illustrating the importance of precise localization of NV centers into nanopillar sensors. The collection efficiency [numerical aperture (NA) = 0.7] as a function of x (z = 8 nm). The inset shows the collection efficiency as a function of z (x = 0). (C) Illustration of the fabrication process of photonic structures based on a top-down method without alignment. The NV center is generated by maskless ion implantation and annealing. The resist is prepared by photolithography or electron beam lithography, and the photonic structure is formed by reactive plasma etching. (D) Illustration of the fabrication process of photonic structures based on self-alignment. PMGI + PMMA double layer on the diamond is used to constrain the position of the etching mask and ion implantation region.