Uncontrolled Microtopography |
Plasma Spraying |
Thermal spraying technique; Vacuum deposition |
Easy to operate; High bonding strength; Economical |
Leakage of ions; Difficult to coat inner surface of small holes |
Grit Blasting |
Forcing abrasive particles against the implant surface |
Simple and low-cost; Roughen the surface |
Low processing efficiency; Blasting material residue |
Chemical Etching |
Removing materials and fabricating roughness |
Low-cost; Leaf-like, needle-like or pyramid-like nanostructures can be obtained |
Depending on acid concentration, temperature, and time |
Anodic Oxidation |
An accelerated electrochemical process |
Simple process; High hardness; Nanometer features; High stability; Enhancing the corrosion resisitance |
High energy consumption; Bonding strength with matrix needs to be further improved |
Controlled Micro- topography |
Laser Treatment |
A physical technique of high density form |
Able to fabricate complex and high resolution topography; Rapid and clean; Good repeatability |
Optimization of all parameters is a big challenge; Multiple treatment sessions and limited |
Photo-lithography |
Selectively dissolving photosensitive polymer and leaving latent on substrate |
Ideal for microsturcture |
Usually requires flat surface and needs chemical post-treatment |
Hot Embossing |
Form a relief pattern at an elevated temperature by pressing master into the polymer |
Cost-effcctive; Precise; Rapid, and mass production |
Restricted to thermoplastics and difficult to fabricate comlex 3D micro- structures |
Micro-milling |
Material-removal process using microscale milling tools |
Simple; Without affecting the key characteristics of implant surface |
Slow and inefficient; Restricted by the available smallest diameter of milling cutters |