Fig. 1. (A) A schematic of the experimental MOCVD setup with showerhead designed to prevent the chalcogen and metal precursor sources from mixing prematurely before reaching the reactor volume. With the gas-phase only approach (B), a liquid-phase-sulfurization approach (C), hybrid gas + liquid growth method (D) and a H2O assisted growth method with a controlled supply of the moderate amount of H2O vapor (E).
