Table A2.
Analytical conditions for residue analysis using GC-MS/MS.
| GC Conditions | |||
| Model | GC 2010 Plus (Shimadzu, Japan) | ||
| Column | ZB-5MS Plus [30 m(L) × 0.25 mm(i.d.), 0.25 μm] | ||
| Injection mode | Splitless | ||
| Carrier gas | He, 1.5 mL/min | ||
| Oven temp. | Rate (°C/min) | Final Temp (°C) | Hold Time (min) |
| 0 | 90 | 3.0 | |
| 20.0 | 120 | 0 | |
| 8.0 | 300 | 3.0 | |
| Injection volume | 2 μL | ||
| Tandem MS conditions | |||
| Model | GC-TQ8050 (Shimadzu, Japan) | ||
| Ionization mode | Electron ionization (EI), −70 eV | ||
| Source temp. | 250 °C | ||
| Interface temp. | 300 °C | ||
| Q2 collision gas | Argon | ||
| Collision pressure | 1.50 mTorr | ||