Figure 4.
Built-in electric field distribution under P-doped and N-doped in (a) inverted and (b) regular photodiodes. The dashed grey lines are used to identify the layers in the devices from (a) to (b). Images of the interfacial E strength at (c) PEDOT:PSS/MAPbI3 and MAPbI3/PC61BM interfaces, (d) TiO2/MAPbI3 and MAPbI3/Spiro interfaces under different doping densities.