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. 2022 Oct 29;12(21):3828. doi: 10.3390/nano12213828

Figure 3.

Figure 3

SEM images of the etch profile evolution with different noble gas species of (a) Ar, (b) Kr, and (c) Xe at varying flow rates of 60 sccm (left column), 65 sccm (middle column), and 70 sccm (right column). The flow rates of the FC precursors and O2 are 6 sccm and 3 sccm, respectively.