. 2022 Nov 16;12(51):32853–32884. doi: 10.1039/d2ra06303d

Raw materials are used for the formation of Cu_xO thin films by the SILAR method.

Formation	Cationic precursors	Complexing agents	Anionic precursors	Ref.
Cu₂O	Cu(CH₃COO)₂·H₂O	Na₂S₂O₃·5H₂O	NaOH	96
	CuSO₄·5H₂O	Na₂S₂O₃·5H₂O	NaOH	96
	Cu(NO₃)₂·3H₂O	Na₂S₂O₃·5H₂O	NaOH	96
	CuCl₂·2H₂O	Na₂S₂O₃·5H₂O	NaOH	96
	CuCl₂·2H₂O	NH₃	H₂O₂	97
CuO	CuCl₂·2H₂O	NH₃	H₂O	98
CuO	Cu(CH₃COO)₂·nH₂O	NH₄CH₃COO	H₂O	99

Raw materials are used for the formation of CuxO thin films by the SILAR method.