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. 2022 Nov 15;12(22):4012. doi: 10.3390/nano12224012
η Efficiency
Voc Open Circuit Voltage
Jsc Short-Circuit Current Density
FF Fill Factor
HTL Hole transport Layer
ETL Electron Transport Layer
DAL Double Absorber Layer
λ Wavelength
p(x) Position-dependent hole concentration
n(x) Position-dependent electron concentration
Ntr± Shallow/bulk carrier concentration
G Electron–hole pair generation
λmin Minimum wavelength
λmax Maximum wavelength
Tfront(λ) Transmission at front contact dependent on wavelength
Rback(λ) Reflection at back contact dependent on wavelength
Rint(λ) Internal reflection at front contact
D Layer thickness
Eg Energy bandgap
α Optical absorption
Ep Photon energy
RRAD Radiative recombination
RAUG Auger recombination
RSRH Schokley Read hall recombination
K Radiative recombination coefficient
Cn,aug Auger–electron recombination coefficient
Cp,aug Auger–hole recombination coefficient
n Electron concentration
p Hole concentration
ni Intrinsic-carrier concentration
τn Electron-carrier lifetime
τp Hole-carrier lifetime
Ntr,DAL Trap density of double absorber layer
Ec Characteristic energy
wg Width of Gaussian energy distribution
wt Width of tail-like distribution
Npeak Peak density of the distribution
Et Energy trap level
Ei Intrinsic energy level
SD(0/+) Single-donor defect states
DD(0/+/2/+) Double-donor defect states
SA(/0) Single-acceptor defect states
DA(2//0/) Double-acceptor defect states
Ntr,H/A Interface defect density at hole transport layer/absorber layer interface
Ntr,A/E Interface defect density at absorber layer/electron transport layer interface