C4F8	octafluorocyclobutane
${\mathrm{CCP}}_{\mathrm{HF}}$	high frequency capacitively coupled plasma
${\mathrm{CCP}}_{\mathrm{LF}}$	low frequency capacitively coupled plasma
CHF3	trifluoromethane
DI	de-ionised
DREM	Deposit, Remove, Etch, Multistep
DRIE	deep reactive ion etching
FC	fluorocarbon
HAR	high-aspect ratio
HNO3	nitric acid
IAD(F)	ion angular distribution (function)
ICP	inductively coupled plasma
IF	image force
LPCVD	low-pressure chemical vapour deposition
MEMS	micro-electromechanical systems
O2	oxygen
poly-Si	polycrystalline silicon
RIE	reactive ion etching
SEM	scanning electron microscopy
SF5+	sulfur pentafluoride cation
SF6	sulphur hexafluoride
SixNy	silicon nitride (undefined)
SOI	silicon-on-insulator
(t-)SiO2	(thermal) silicon dioxide
TASCT	Trench-Assisted Surface Channel Technology