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Details of the deposition modes used.
| Sample No. | Partial Gas Pressure, Pa, N2/O2 | Negative Bias Voltage | Films | N2/O2 Ratio |
|---|---|---|---|---|
| control (NiTi) | - | - | - | - |
| 1 | 0/0.130 | U = −100 V | TiO2 | - |
| 2 | 0/0.130 | U = 0 | TiO2 | - |
| 3 | 0.065/0.065 | U = −100 V | Ti-O-N | 1/1 |
| 4 | 0.065/0.065 | U = 0 | Ti-O-N | 1/1 |
| 5 | 0.087/0.046 | U = −100 V | Ti-O-N | 2/1 |
| 6 | 0.087/0.046 | U = 0 | Ti-O-N | 2/1 |
| 7 | 0.102/0.033 | U = −100 V | Ti-O-N | 3/1 |
| 8 | 0.102/0.033 | U = 0 | Ti-O-N | 3/1 |
