Abbreviation	Description	Unit
FEBID	Focused electron beam induced deposition	- - -
3DNP	3D Nanoprinting	- - -
HC	Hollow cone	- - -
AFM	Atomic force microscopy	- - -
EFM	Electrostatic force microscopy	- - -
CAFM	Conductive AFM	- - -
KFM	Kelvin force microscopy	- - -
SEM	Scanning electron microscope	- - -
FIB	Focused ion beam	- - -
DBM	Dual-beam microscope	- - -
STEM	Scanning transmission electron microscope	- - -
HAADF	High-angle annular dark field	- - -
EDXS	Energy-dispersive X-ray spectroscopy	- - -
PoP	Point pitch: distance between patterning pixels	nm
fp	Fast point pitch: PoP along pattern circumference	nm
sp	Slow point pitch: increment between successive circles	nm
DT	Dwell time: exposure at individual pixel points	ms
TET	Total exposure time: full patterning duration	s
VGR	Volume growth rate: timely normalized deposition volume (over tet)	nm3·s−1