Table 1.
The table summarizes the parameters used during the pulsed laser deposition (beam energy and laser fluence), the quantities characterizing the laser ablation process (average ablation rate, number of atoms per pulse and average ablation efficiency) and the deposition process (film thickness at 7 mm from the film center, deposition rate and film surface droplet density).
| Sample | A1 | A2 | A3 | A4 | A5 |
|---|---|---|---|---|---|
| Energy (mJ) |
2.2 | 3.7 | 6.9 | 13.6 | 15.3 |
| Laser fluence (J/cm2) |
0.4 | 0.5 | 0.8 | 1.1 | 3.3 |
| Average ablation rate (ng/pulse) |
18.8 | 21.0 | 22.9 | 24.6 | 33.2 |
| Atoms/pulse (n/pulse) × 1015 |
1.05 | 1.17 | 1.28 | 1.37 | 1.85 |
| Average ablation efficiency (ng/(pulse × J)) |
8.5 | 5.7 | 3.3 | 1.8 | 2.2 |
| Thickness (nm) |
32 | 70 | 125 | 265 | 200 |
| Deposition rate (nm/pulse) × 10−4 |
8 | 18 | 31 | 66 | 50 |
| Droplet density (n/μm2) |
0.47 | 0.55 | 0.75 | 0.84 | flakes |