Gray-scale photolithography using microfluidic photomasks -- Data Supplement - Supporting Information -- Proceedings of the National Academy of Sciences

Supporting information for Chen et al. (2003) Proc. Natl. Acad. Sci. USA, 10.1073/pnas.0435755100

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Fig. 6.
Plot of photoresist heights vs. the multiplications of dye concentrations (C_d) and the channel depth (H_L). Measured photoresist heights after exposure through microfluidic photomasks (µFPMs) in each experiment are shown in different colors. The µFPMs had a channel height H_L = 62.4 µm (circles) or H_L = 38.9 µm (triangles).