data_STF_e _audit_creation_date 2016-04-26 _audit_creation_method ; Olex2 1.2 (compiled 2015.01.26 svn.r3150 for OlexSys, GUI svn.r4998) ; _publ_contact_author_name ; 'Pablo J. Bereciartua' 'Jose Luis Jorda' ; _publ_contact_author_email ; 'Pablo J. Bereciartua' 'pabbepe@itq.upv.es' 'Jose Luis Jorda' 'jjorda@itq.upv.es' ; _publ_contact_author_address ; Instituto de Tecnologia Quimica CSIC-UPV Universidad Politecnica de Valencia Avenida de los naranjos s/n 46022 Valencia Spain ; _publ_contact_author_fax '34 96 387 9448' _publ_contact_author_phone '34 96 387 7800' _publ_section_references ; Burla, M.C., Caliandro, R., Camalli, M., Carrozzini, B., Cascarano, G.L., De Caro, L., Giacovazzo, C., Polidori, G., Siliqi, D., Spagna, R. (2007). J. Appl. Cryst. 40, 609-613. Dolomanov, O.V., Bourhis, L.J., Gildea, R.J, Howard, J.A.K. & Puschmann, H. (2009), J. Appl. Cryst. 42, 339-341. Sheldrick, G.M. (2008). Acta Cryst. A64, 112-122. ; _chemical_name_common ? _chemical_name_systematic ? _chemical_formula_moiety 'O8 Si4' _chemical_formula_sum 'O8 Si4' _chemical_formula_weight 240.34 _chemical_melting_point ? _shelx_space_group_comment ; The symmetry employed for this shelxl refinement is uniquely defined by the following loop, which should always be used as a source of symmetry information in preference to the above space-group names. They are only intended as comments. ; _space_group_crystal_system 'monoclinic' _space_group_IT_number 12 _space_group_name_H-M_alt 'C 1 2/m 1' _space_group_name_Hall '-C 2y' loop_ _space_group_symop_operation_xyz 'x, y, z' '-x, y, -z' 'x+1/2, y+1/2, z' '-x+1/2, y+1/2, -z' '-x, -y, -z' 'x, -y, z' '-x+1/2, -y+1/2, -z' 'x+1/2, -y+1/2, z' _cell_length_a 13.734 _cell_length_b 17.946 _cell_length_c 7.266 _cell_angle_alpha 90 _cell_angle_beta 99.50 _cell_angle_gamma 90 _cell_volume 1766.4 _cell_formula_units_Z 8 _cell_measurement_reflns_used ? _cell_measurement_temperature 293(2) _cell_measurement_theta_max ? _cell_measurement_theta_min ? _shelx_estimated_absorpt_T_max ? _shelx_estimated_absorpt_T_min ? _exptl_absorpt_coefficient_mu 0.000 _exptl_absorpt_correction_T_max ? _exptl_absorpt_correction_T_min ? _exptl_absorpt_correction_type ? _exptl_absorpt_process_details ? _exptl_absorpt_special_details ? _exptl_crystal_colour ? _exptl_crystal_density_diffrn 1.807 _exptl_crystal_density_meas ? _exptl_crystal_density_method ? _exptl_crystal_description ? _exptl_crystal_F_000 313 _exptl_crystal_size_max ? _exptl_crystal_size_mid ? _exptl_crystal_size_min ? _exptl_transmission_factor_max ? _exptl_transmission_factor_min ? _diffrn_reflns_av_R_equivalents 0.1147 _diffrn_reflns_av_unetI/netI 0.1097 _diffrn_reflns_Laue_measured_fraction_full 0.538 _diffrn_reflns_Laue_measured_fraction_max 0.538 _diffrn_reflns_limit_h_max 14 _diffrn_reflns_limit_h_min -14 _diffrn_reflns_limit_k_max 19 _diffrn_reflns_limit_k_min -19 _diffrn_reflns_limit_l_max 8 _diffrn_reflns_limit_l_min -8 _diffrn_reflns_number 1602 _diffrn_reflns_point_group_measured_fraction_full 0.538 _diffrn_reflns_point_group_measured_fraction_max 0.538 _diffrn_reflns_theta_full 0.823 _diffrn_reflns_theta_max 0.823 _diffrn_reflns_theta_min 0.067 _diffrn_ambient_temperature 293(2) _diffrn_detector_area_resol_mean ? _diffrn_measured_fraction_theta_full 0.538 _diffrn_measured_fraction_theta_max 0.538 _diffrn_measurement_device 'transmission electron microscope' _diffrn_measurement_device_type 'JEOL JEM-2100F' _diffrn_measurement_method '\o-scan' _diffrn_radiation_type electrons _diffrn_radiation_wavelength 0.0251 _diffrn_source ? _reflns_Friedel_coverage 0.000 _reflns_Friedel_fraction_full . _reflns_Friedel_fraction_max . _reflns_number_gt 579 _reflns_number_total 774 _reflns_special_details ; Reflections were merged by SHELXL according to the crystal class for the calculation of statistics and refinement. _reflns_Friedel_fraction is defined as the number of unique Friedel pairs measured divided by the number that would be possible theoretically, ignoring centric projections and systematic absences. ; _reflns_threshold_expression 'I > 2\s(I)' _computing_cell_refinement ? _computing_data_collection ? _computing_data_reduction ? _computing_molecular_graphics 'Olex2 (Dolomanov et al., 2009)' _computing_publication_material 'Olex2 (Dolomanov et al., 2009)' _computing_structure_refinement 'ShelXL (Sheldrick, 2008)' _computing_structure_solution 'SIR2014 (Burla et al., 2015)' _refine_diff_density_max 0.432 _refine_diff_density_min -0.480 _refine_diff_density_rms 0.105 _refine_ls_extinction_coef . _refine_ls_extinction_method none _refine_ls_goodness_of_fit_ref 2.502 _refine_ls_hydrogen_treatment undef _refine_ls_matrix_type full _refine_ls_number_parameters 40 _refine_ls_number_reflns 774 _refine_ls_number_restraints 20 _refine_ls_R_factor_all 0.3161 _refine_ls_R_factor_gt 0.2882 _refine_ls_restrained_S_all 2.572 _refine_ls_shift/su_max 0.000 _refine_ls_shift/su_mean 0.000 _refine_ls_structure_factor_coef Fsqd _refine_ls_weighting_details 'w=1/[\s^2^(Fo^2^)+(0.2000P)^2^] where P=(Fo^2^+2Fc^2^)/3' _refine_ls_weighting_scheme calc _refine_ls_wR_factor_gt 0.6095 _refine_ls_wR_factor_ref 0.6439 _refine_special_details ? _olex2_refinement_description ; 1. Restrained distances Si1-O8_$1 = Si1-O3 = Si1-O1 = Si1-O6_$2 1.61 with sigma of 0.02 Si2-O1 = Si2-O5 = Si2-O6 = Si2-O7 1.61 with sigma of 0.02 Si3-O7 = Si3-O8 = Si3-O9 = Si3-O10_$3 1.61 with sigma of 0.02 Si4-O2 = Si4-O4_$4 = Si4-O10 = Si4-O10_$5 1.61 with sigma of 0.02 Si5-O2 = Si5-O4 = Si5-O5 = Si5-O5_$5 1.61 with sigma of 0.02 2. Uiso/Uaniso restraints and constraints Uiso(Si1) = Uiso(Si2) = Uiso(Si3) = Uiso(Si4) = Uiso(Si5) Uiso(O1) = Uiso(O2) = Uiso(O3) = Uiso(O4) = Uiso(O5) = Uiso(O6) = Uiso(O7) = Uiso(O8) = Uiso(O9) = Uiso(O10) ; _atom_sites_solution_hydrogens . _atom_sites_solution_primary direct _atom_sites_solution_secondary ? loop_ _atom_site_label _atom_site_type_symbol _atom_site_fract_x _atom_site_fract_y _atom_site_fract_z _atom_site_U_iso_or_equiv _atom_site_adp_type _atom_site_occupancy _atom_site_site_symmetry_order _atom_site_calc_flag _atom_site_refinement_flags_posn _atom_site_refinement_flags_adp _atom_site_refinement_flags_occupancy _atom_site_disorder_assembly _atom_site_disorder_group Si1 Si 0.8928(7) 0.2485(5) 0.4147(13) 0.059(3) Uiso 1 1 d D . . . . Si2 Si 0.7143(8) 0.1552(5) 0.3222(14) 0.059(3) Uiso 1 1 d D . . . . Si3 Si 0.6012(8) 0.1547(6) -0.0583(14) 0.059(3) Uiso 1 1 d D . . . . Si4 Si 0.4291(10) 0.0000 0.2208(18) 0.059(3) Uiso 1 2 d DS T P . . Si5 Si 0.6457(11) 0.0000 0.3877(18) 0.059(3) Uiso 1 2 d DS T P . . O1 O 0.8249(12) 0.1769(9) 0.390(3) 0.070(3) Uiso 1 1 d D . . . . O2 O 0.5466(13) 0.0000 0.244(3) 0.070(3) Uiso 1 2 d DS T P . . O3 O 1.0000 0.2219(14) 0.5000 0.070(3) Uiso 1 2 d DS T P . . O4 O 0.6224(18) 0.0000 0.598(2) 0.070(3) Uiso 1 2 d DS T P . . O5 O 0.7144(12) 0.0676(8) 0.348(2) 0.070(3) Uiso 1 1 d D . . . . O6 O 0.6501(12) 0.1981(9) 0.445(2) 0.070(3) Uiso 1 1 d D . . . . O7 O 0.6817(14) 0.1748(10) 0.111(2) 0.070(3) Uiso 1 1 d D . . . . O8 O 0.6167(15) 0.2031(9) -0.235(2) 0.070(3) Uiso 1 1 d D . . . . O9 O 0.5000 0.1737(14) 0.0000 0.070(3) Uiso 1 2 d DS T P . . O10 O 0.3893(13) -0.0701(7) 0.100(2) 0.070(3) Uiso 1 1 d D . . . . _geom_special_details ; All esds (except the esd in the dihedral angle between two l.s. planes) are estimated using the full covariance matrix. The cell esds are taken into account individually in the estimation of esds in distances, angles and torsion angles; correlations between esds in cell parameters are only used when they are defined by crystal symmetry. An approximate (isotropic) treatment of cell esds is used for estimating esds involving l.s. planes. ; loop_ _geom_bond_atom_site_label_1 _geom_bond_atom_site_label_2 _geom_bond_distance _geom_bond_site_symmetry_2 _geom_bond_publ_flag Si1 O1 1.580(14) . ? Si1 O3 1.574(11) . ? Si1 O6 1.583(14) 7_656 ? Si1 O8 1.556(14) 7_655 ? Si2 O1 1.566(15) . ? Si2 O5 1.582(15) . ? Si2 O6 1.558(15) . ? Si2 O7 1.569(14) . ? Si3 O7 1.552(14) . ? Si3 O8 1.593(14) . ? Si3 O9 1.556(12) . ? Si3 O10 1.559(13) 5_655 ? Si4 O2 1.595(17) . ? Si4 O4 1.594(16) 2_656 ? Si4 O10 1.579(11) 6 ? Si4 O10 1.579(11) . ? Si5 O2 1.574(15) . ? Si5 O4 1.613(15) . ? Si5 O5 1.592(12) 6 ? Si5 O5 1.592(12) . ? O3 Si1 1.574(11) 2_756 ? O4 Si4 1.594(16) 5_656 ? O6 Si1 1.583(14) 7_656 ? O8 Si1 1.556(14) 7_655 ? O9 Si3 1.556(12) 2_655 ? O10 Si3 1.559(13) 5_655 ? loop_ _geom_angle_atom_site_label_1 _geom_angle_atom_site_label_2 _geom_angle_atom_site_label_3 _geom_angle _geom_angle_site_symmetry_1 _geom_angle_site_symmetry_3 _geom_angle_publ_flag O1 Si1 O6 107.0(13) . 7_656 ? O3 Si1 O1 107.2(12) . . ? O3 Si1 O6 110.7(9) . 7_656 ? O8 Si1 O1 113.0(10) 7_655 . ? O8 Si1 O3 116.3(11) 7_655 . ? O8 Si1 O6 102.3(11) 7_655 7_656 ? O1 Si2 O5 103.2(9) . . ? O1 Si2 O7 110.8(12) . . ? O6 Si2 O1 108.0(12) . . ? O6 Si2 O5 114.3(11) . . ? O6 Si2 O7 110.7(12) . . ? O7 Si2 O5 109.5(10) . . ? O7 Si3 O8 109.8(11) . . ? O7 Si3 O9 106.6(10) . . ? O7 Si3 O10 107.9(10) . 5_655 ? O9 Si3 O8 110.2(11) . . ? O9 Si3 O10 111.9(13) . 5_655 ? O10 Si3 O8 110.4(11) 5_655 . ? O4 Si4 O2 119.6(15) 2_656 . ? O10 Si4 O2 108.0(10) 6 . ? O10 Si4 O2 108.0(10) . . ? O10 Si4 O4 107.4(10) 6 2_656 ? O10 Si4 O4 107.4(10) . 2_656 ? O10 Si4 O10 105.7(13) . 6 ? O2 Si5 O4 110.2(16) . . ? O2 Si5 O5 110.7(10) . . ? O2 Si5 O5 110.7(10) . 6 ? O5 Si5 O4 112.7(9) 6 . ? O5 Si5 O4 112.7(9) . . ? O5 Si5 O5 99.3(16) . 6 ? Si2 O1 Si1 139.7(14) . . ? Si5 O2 Si4 144.9(19) . . ? Si1 O3 Si1 144.7(19) 2_756 . ? Si4 O4 Si5 165.3(18) 5_656 . ? Si2 O5 Si5 142.1(13) . . ? Si2 O6 Si1 167.1(14) . 7_656 ? Si3 O7 Si2 140.7(14) . . ? Si1 O8 Si3 167.6(15) 7_655 . ? Si3 O9 Si3 154.7(19) 2_655 . ? Si3 O10 Si4 148.5(12) 5_655 . ? _shelx_SHELXL_version_number '2014/7' _olex2_submission_special_instructions 'No special instructions were received'