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. Author manuscript; available in PMC: 2020 Sep 8.
Published in final edited form as: ACS Appl Mater Interfaces. 2020 Aug 5;12(33):37732–37740. doi: 10.1021/acsami.0c09630

Figure 1.

Figure 1

Photography of the thin films obtained from (a) the sublimation of NiDPP and (b–f) oCVD reaction of NIDPP and FeCl3 at different substrate temperatures: (b) 25, (c) 50, (d) 100, (e) 150, and (f) 200 °C. (a) Substrate temperature was 150 °C for the preparation of the reference thin film without oxidant.