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. Author manuscript; available in PMC: 2012 Oct 1.
Published in final edited form as: J Vac Sci Technol B Nanotechnol Microelectron. 2011 May 10;29(3):032001. doi: 10.1116/1.3581102

FIG. 1.

FIG. 1

SEM images of post-processed magnets fabricated by a problematic batch fabrication approach, as outlined in Fig. 2 of Ref. 16. In this report we will discuss an alternative method that significantly improves the magnet yield. (a) The integrated magnets of Ref. 16 overhang the leading edge of 200 µm-long cantilevers. (b) Less than 1% of the fabricated magnets survived processing. Two common damage scenarios observed after processing were (c) complete magnet absence or (d) substantial magnet damage at the leading edge. The scale bar represents 20 µm in (a) and 200 nm in (b-d).