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. 2023 Mar 8;616(7958):707–711. doi: 10.1038/s41586-023-05773-7

Fig. 1. Schematic of the virtual process used in the game.

Fig. 1

The input of the virtual process is a ‘recipe’ that controls the plasma interactions with a silicon wafer. For a given recipe, the simulator outputs metrics along with a cross-sectional image of a profile on the wafer. The target profile is shown along with examples of other profiles that do not meet target. The goal of the game is to find a suitable recipe at the lowest cost-to-target. CD, critical dimension.