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. Author manuscript; available in PMC: 2024 Sep 24.
Published in final edited form as: Environ Sci Process Impacts. 2024 Jun 19;26(6):1090–1106. doi: 10.1039/d4em00144c

Ozone Generation and Chemistry from 222nm Germicidal Ultraviolet Light in a Fragrant Restroom

Michael F Link a, Rileigh L Robertson a, Andrew Shore a, Behrang H Hamadani a, Christina E Cecelski a, Dustin G Poppendieck a
PMCID: PMC11421862  NIHMSID: NIHMS2021623  PMID: 38787731

Abstract

Devices using 222nm germicidal ultraviolet light (GUV222) have been marketed to reduce virus transmission indoors with low risk of occupant harm from direct UV exposure. GUV222 generates ozone, an indoor air pollutant and oxidant, under constrained laboratory conditions, but the chemistry byproducts of GUV222-generated ozone in real indoor spaces is uncharacterized. We deployed GUV222 in a public restroom, with an air change rate of 1 h−1 one weekend and 2 h−1 the next, to measure ozone formation and byproducts generated from ozone chemistry indoors. Ozone from GUV222 increased background concentrations by 5 ppb on average for both weekends and reacted rapidly (e.g., at rates of 3.7 h−1 for the first weekend and 2.0 h−1 for the second) with gas-phase precursors emitted by urinal screens and on surfaces. These ozone reactions generated volatile organic compound and aerosol byproducts (e.g., up to 2.6 μg m−3 of aerosol mass). We find that GUV222 is enhancing indoor chemistry by at least a factor of two for this restroom. The extent of this enhanced chemistry will likely be different for different indoor spaces and is dependent upon ventilation rates, species and concentrations of precursor VOCs, and surface reactivity. Informed by our measurements of ozone reactivity and background aerosol concentrations, we present a framework for predicting aerosol byproduct formation from GUV222 that can be extended to other indoor spaces. Further research is needed to understand how typical uses of GUV222 could impact air quality in chemically diverse indoor spaces and generate indoor air chemistry byproducts that can affect human health.

Graphical Abstract

graphic file with name nihms-2021623-f0001.jpg

Introduction

In the early stages of the COVID-19 pandemic, challenges associated with mitigating airborne virus transmission in public spaces motivated the development of new ventilation and disinfection standards in the United States.1 In particular, the American Society of Heating, Refrigerating, and Air-Conditioning Engineers (ASHRAE) created Standard 241-2023 “Control of Infectious Aerosols”. This standard prescribes minimum effective per person clean airflow rates to be achieved using mechanical ventilation supplemented by air disinfection technologies when the system is in an infection risk management mode—if necessary.2 Germicidal ultraviolet light with a peak emission wavelength at 222nm (GUV222) has been promoted as a possible airborne pathogen transmission mitigation tool. GUV222 could be an important tool because it possibly can efficiently deactivate airborne viruses3-6 and directly irradiate human occupied spaces—potentially without causing acute or chronic harm to skin or eyes7-9. Public transportation10, restrooms11, 12, elevators13, and environments where occupants are in close contact (e.g., classrooms and conference rooms) are examples of public spaces where GUV222 could be useful.14

An unintended characteristic of GUV222 is that it produces ozone (O3), an indoor air pollutant, which can oxidize chemicals in the air, on particles, and on surfaces; resulting in degraded indoor air quality.15-17 Several studies have determined, through calculations9, 18, 19, that O3 concentrations produced from GUV222 would not be expected to exceed the Environmental Protection Agency 8-hour National Ambient Air Quality Standard for outdoor air of 70 parts-per-billion (70 nmol of O3 per mol of air) when properly installed (i.e., appropriate irradiance levels and ventilation rates) in indoor spaces. However, no minimum threshold currently exists for which O3 exposure may produce adverse health outcomes20-22. Further, the reactive chemistry that O3 initiates indoors22 can produce gas-phase and particulate pollutants that may represent greater exposure risks than O3 itself23, 24. Our knowledge of real-world impacts of GUV222 on indoor air quality is limited, in part, by a lack of field measurements in indoor spaces where GUV222 may typically be used.

In most indoor spaces the only source of O3 is from outdoor air infiltration which creates a background amount of byproduct formation from O3 chemistry25. Introducing an additional source of O3, such as with GUV222, can potentially enhance byproduct formation above background levels15. Although chemically identical, we differentiate the O3 that is generated by GUV222 (GUV222-generated O3) from the O3 that is brought indoors from outdoor air infiltration to discuss the enhanced impacts of GUV222 on indoor O3 chemistry. We note that the O3 chemistry that we discuss in this work is applicable to any other device that would generate indoor O3 and there is nothing unique about the O3 that is generated from GUV222. When O3 reacts on surfaces, or with volatile organic compound (VOC) precursors in the gas-phase, it can form oxygenated VOC byproducts including aldehydes and reactive oxygen species—like peroxides26. Hydroxyl radicals (OH) are a stronger gas-phase oxidant than O3 and importantly are produced from reactions of O3 with unsaturated VOCs. Formed OH can then react with other VOCs indoors that do not readily react with O3.16 Reactions of both O3 and OH can form gas-phase byproducts with sufficiently low vapor pressures that they can nucleate aerosol and/or condense to existing aerosol and increase aerosol mass concentrations. While we focus on O3 chemistry here, 222nm light has been shown to induce other reactions in the gas-phase27 and in aqueous solution28 suggesting chemistry other than that initiated by ozone may also impact indoor air quality.

Most studies suggest GUV222 should not be used in indoor spaces with “low” levels of ventilation15, 18, 29. However, the conditions of “low” ventilation have not been defined. In addition, the role of ambient precursor VOC and particulate matter concentrations in regulating byproduct production from GUV222-generated O3 has not been addressed. In short, there is no real-world data to understand the relationship between ventilation (quantified here from the air change rate, ACR), precursor concentrations, and byproduct production potential from GUV222 that could be used to inform operational guidance.

Here we used a 59 m3 unoccupied restroom as a case study for understanding indoor air quality impacts of GUV222 in a real-world application. We deployed GUV222 in the restroom over two weekends. We investigated the role of ventilation in mitigating byproduct formation from GUV222 by providing no mechanical ventilation the first weekend (ACR1h-1) and with mechanical ventilation the second weekend (ACR2h-1). We used the removal of GUV222-generated O3 to understand how much O3 was reacting with surfaces and precursor VOCs to form observed VOC and aerosol O3 chemistry byproducts. We find that while increased ventilation can help decrease byproduct formation from GUV222, VOC and aerosol byproducts are still measurable at an ACR of approximately 2 h−1. Informed by the changing precursor VOC concentrations in the air in the restroom over the two weekends, we identify what conditions of precursor O3 reactivity, ventilation, and pre-existing aerosol concentrations are likely to produce measurable VOC and aerosol byproducts from GUV222-generated O3 chemistry. Finally, we present a framework that could be applied to other indoor spaces to help determine the extent that GUV222 may degrade indoor air quality.

Materials and Methods

Experimental design

Measurements were conducted in an unoccupied 59 m3 restroom (Fig. 1) in a building on the campus of the National Institute of Standards and Technology (NIST) in Gaithersburg Maryland, USA on two consecutive weekends (weekend 1, Wk1, and weekend 2, Wk2). The floor and walls of the restroom are tile with a painted ceiling. Polished metal partitions separated the urinals and painted partitions separated the toilets. The surface area of the restroom, including partitions, is 142 m2. For each weekend, the experiments started Friday evening at 8:00 p.m. and ended Monday morning at 6:00 a.m. During the experiments the entrance to the restroom was kept closed and remained unoccupied. Otherwise, the restroom was open for use by NIST staff and guests throughout the week. While the door was kept closed, the ingress of sampling lines prevented the door from fully closing. The average temperature in the restroom for the two weekends was 25 °C ± 1 °C with an average relative humidity of 45 % ± 3 %. ACRs were measured using acetone as a tracer during Wk1 and sulfur hexafluoride (SF6) as a tracer in Wk2 (Supplementary Materials, Section S3).

Fig. 1. Schematic of the tested restroom.

Fig. 1.

Toilets and stalls are shown on the bottom part of the schematic. Stall doors were opened inwards and are not shown. A segment of wall separates two parts of the restroom where each side contains two sinks and two urinals. The entrance to the restroom is shown in the bottom left corner of the room. The exhaust vents for the mechanical ventilation are located above the urinals and one is above the middle of the stalls. The window recess on the top left is where the scanning mobility particle sizer (SMPS) instrument was located. GUV222 lamps are labelled in the figure. The mixing fan was placed below one of the GUV222 lamps. The lamps and fan were controlled automatically using a digitally controlled relay.

For Wk1, outside air and air from the hallway passively entered the restroom providing moderate ventilation (ACR1h-1). For Wk2, the mechanical ventilation system was turned on which created a negative pressure in the restroom and drew air in from the hallway then exhausted it out through ventilation ducts (ACR2h-1). Outdoor air infiltration was also possible, but we did not measure the chemical composition of outdoor air. Instead, we use measurements of VOCs and O3 in the hallway to quantify the influence of hallway air ventilation on the restroom.

On weekdays custodial staff cleaned the restroom in the morning around 10:00 a.m. Four porcelain urinals are in the restroom, and each held a urinal screen. As part of scheduled routine maintenance, custodial staff replaced old urinal screens with new ones approximately 38 hours before the first GUV222 on/off cycle on Wk1. At the start of the first GUV222 on/off cycle for Wk2 the urinal screens were approximately 206 hours old. Using online proton-transfer mass spectrometry coupled to gas-chromatography (GC-PTR-MS) we measured the concentrations of O3-reactive VOCs emitted from the urinal screens in the restroom including α-terpinene, linalool, limonene, ocimene, linalyl acetate, and terpinolene. The concentrations of reactive VOCs decreased by approximately an order of magnitude from the beginning of Wk1 to the beginning of Wk2 due to the combined effects of lower emission rates from the urinal screens and the increased air change rate (Fig. S1-4).

Three GUV222 lamps were installed at different locations in the restroom with two projecting light down at a 20° angle normal to the floor from a height of 2.4 m and one projecting light parallel to the floor at a height of 2.0 m and unobstructed for 1.4 m. From measurements of the radial and angular distribution of the light from the lamps, informed by modeling in our previous study17, we expect that > 75 % of the O3 is generated within 2 m of the lamp (Figure S9). All of the lamps experienced some attenuation of the light by restroom walls and/or stall partitions. Lamp, mixing fan, and do-it-yourself (DIY) air cleaner on/off cycles were automated using a custom computer program and a digitally controlled relay. Our measurements of per-lamp O3 generation rates (determined from mass-balance modeling of O3 concentrations and discussed later) suggest a room-averaged fluence rate of 3.2 μW cm−2 which is more than a value of 1.5 μW cm−2 suggested by a recent study30 to accomplish disinfection while limiting human exposure to radiation. Operational guidance on recommended fluence rates from GUV222 currently does not exist.

The background (“GUV222 OFF”) air quality of the restroom during Weekend One (Wk1) was characterized by high concentrations of reactive terpenoid VOCs (20 ppb of total terpenoids) whereas lower reactive terpenoid VOC concentrations (5 ppb of total terpenoids) defined background conditions for Weekend Two (Wk2).

Instrumentation

A scanning mobility particle sizer was located in the restroom and sampled particles from 10 nm to 420 nm with 1.5 min resolution. All chemical instrumentation was located down the hall from the restroom in a nearby conference room. A 9.5 mm (3/8”) outer diameter PFA sampling line for VOCs and a 6.3 mm (1/4”) outer diameter sampling line for trace gases (O3, NOx, and formaldehyde) were run from the conference room to the restroom to two separate multi-port valve systems that switched between three locations (hallway, restroom center, and restroom ventilation duct) on three-minute intervals. Two bypass pumps were used to draw air at a flowrate of 15 L min−1 through the VOC line and 10 L min−1 through the trace gas (O3, NOx, and formaldehyde) line. Sampling lines for both the trace gases and the PTR-MS were located approximately 2.5 m directly in the line with the radial projection of light from one of the lamps. We do not expect enhanced local production of O3 or other byproducts at the gas sampling locations because most of the light is attenuated after 2 m. O3 was measured with a dual-beam absorption spectrometer, NOx was measured with a cavity-attenuated phase-shift spectrometer, and formaldehyde was measured with an infrared laser absorption spectrometer.

A Time-of-flight Proton-Transfer Mass Spectrometer (PTR-MS) equipped with a gas chromatograph (GC) was used to sample VOCs. Most of the time the PTR-MS sampled in real-time acquisition at a rate of 1 Hz. GC samples were collected several times during the two weekends. Hourly calibrations were performed using two separate multi-component VOC standard calibration cylinders during Wk1 and two NIST-certified monoterpene calibration cylinders during Wk2 (Tables S2 and S3). Hourly backgrounds were measured using ultra zero air. PTR-MS signals that were not calibrated for directly were converted to concentrations using a parameterization of the instrument sensitivity with the proton-transfer rate constant31-33.

Terpenoids were an important source of gas-phase reactivity in the restroom. We provide an in-depth discussion of terpenoid quantification in the Supplementary Materials. Briefly, we use both GC-PTR-MS and real-time PTR-MS data to quantify terpenoids. We quantified 1,8-cineloe and linalool from GC-PTR-MS measurements. Additionally, we quantified monoterpenes including α-pinene, β-pinene, limonene, α-terpinene, ocimene, terpinolene, and camphene from GC-PTR-MS measurements when available. When GC-PTR-MS samples were not available we used the real-time measurement of the C10H17+, for monoterpenes, and C10H19O+ ion signals to estimate increases or decreases in terpenoid concentrations from the GC-PTR-MS measurements. Linalyl and isobornyl acetate were quantified from the real-time C12H21O2+ ion signal. We assumed that decreases in the C12H21O2+ ion signal that occurred when the lamps were on indicated reaction of linalyl acetate with O3.

O3 Reactive Loss Calculations

Recently, the difference between outdoor and indoor O3 concentrations, “O3 loss”, has been suggested to be a surrogate for predicting gas and particle concentrations of O3 chemistry byproducts indoors25. Similar to the O3 loss framework presented by Weschler and Nazaroff (2023), we compare the background O3 reactive loss from hallway infiltration to the O3 reactive loss from GUV222-generated O3 and quantify the enhanced byproduct formation induced by GUV222, compared to background conditions, in the restroom.

The O3 chemistry that occurs in the restroom during both weekends without the influence of the GUV222 lamps defines background conditions. Under background conditions in the restroom, the primary source of O3 is passive ventilation from the hallway. However, GUV222 introduces an additional source of O3 to the restroom. Once in the restroom, either introduced from GUV222 or from the hallway, O3 is removed by ventilation and reactive losses. The O3 concentration and reactive loss in the restroom can thus be modeled following the mass-balance in Equation 1,

[O3]rest,t=[O3]rest,0ekO3removalt+(NlampGR03V+[O3]hallACR)kO3removal(1ekO3removalt) (1)

where [O3] is the O3 concentration in the restroom (rest) or hallway (hall), ACR is the air change rate (h−1), Nlamp is the number of GUV222 lamps in the restroom (Nlamp=3lamps), GR03 is the per-lamp O3 generation rate (μg h−1 lamp−1), V is the volume of the restroom (59 m3), and k03removal is the first-order loss rate constant representing the sum of all processes removing O3 from the restroom (h−1). We modeled O3 concentrations in the restroom using Equation 1 for Wk1 and Wk2 to determine the GR03 and k03,removal. We calculated an GR03 of 850 μg h−1 lamp−1 for Wk1 and an GR03 of 1000 μg h−1 lamp−1 for Wk2 resulting in an average GR03 for Wk1 and Wk2 in the restroom of 930 μg h−1 lamp−1 ± 110 μg h−1 lamp−1 (≈ 8 ppb h−1 lamp−1 ± 1 ppb h−1 lamp−1 in the 59 m3 restroom). The GR03 we measured in the restroom is approximately 25 % lower than the GR03 we measured from one of the lamps in our chamber (1220 μg h−1)17 likely due to attenuation of the light by the walls and the stall partitions.

Ventilation and total reactive losses (k03,reactive loss) define k03,removal,

kO3.removal=kO3.reactive loss+ACR (2)

We distinguish O3 removal from O3 reactive loss because O3 removed via air change does not contribute to the chemistry in the restroom. O3 removal is the sum of all processes removing O3 from the restroom and O3 reactive loss is the first-order rate constant representing the sum of all O3 gas-phase and surface reactive loss processes,

kO3.reactive loss=kloss.surface+kloss.NO+kloss.VOC (3)

where kloss,surface is the first-order O3 reactive loss rate constant to surfaces (h−1), kloss,NO is the first-order rate constant for reaction with NO (h−1), and kloss,VOC is the first-order rate constant for reaction with gas-phase VOCs (h−1).

When modeling O3 concentrations in the restroom, using Equation 1, we constrained the ACR, kloss,VOC, and kloss,NO with measurements—leaving kloss,surface as an unknown variable. We determined the ACR using Equation S2, from the decay of acetone, for Wk1, and the decay of SF6, for Wk2 (Fig. S7). kloss,NO is determined by multiplying the bimolecular rate constant for the reaction of NO with O3 (kNO+O31.9×10-14cm3 molecules−1 s−1 at 298 K)34 with the NO concentration (molecules cm−3) measured in the restroom.

kloss.NO=kNO+O3[NO]restroom (4)

Reactions with terpenoids were the most important gas-phase sinks of O3 in the restroom and we calculated the contribution of terpenoid + O3 reactions to kloss,VOC following Equation 5,

kloss.VOC=(kVOC.i+O3[VOC]i) (5)

where i denotes an individual terpenoid, kVOC+O3 is the bimolecular rate constant for the reaction of O3 and a terpenoid (cm3 molecules−1 s−1), and [VOC] is the terpenoid concentration in the restroom (molecules cm−3). α-Terpinene, linalool, and linalyl acetate contributed the most to the gas-phase O3 + VOC reactive loss with ocimene, terpinolene, and limonene making smaller contributions (Fig. S8). Other terpenoids made negligible contributions to kloss,VOC because they were either present in low concentrations (α-pinene, β-pinene) and/or were not reactive enough to O3 (e.g., camphene). Many VOCs emitted from the urinal screens were effectively unreactive towards O3 (e.g., 1,8-cineole, isobornyl acetate), but could be reactive to OH generated from O3 + VOC reactions. These VOCs may also contribute to VOC or particle byproduct formation from OH reactions, but potential OH chemistry was indistinguishable from O3 chemistry in our experiments. We assume any O3 removal not explained by air change or by reaction with NO or VOCs is attributable to surface loss (kloss,surface). Our measured and modeled O3 concentrations, using Equations 1 through 5, are different by no more than 20 % for each weekend (Fig. S11 and S12). More details on the O3 modeling are provided in the Supplementary Materials (Section S6).

Respirable particle modeling

An open-source multiple-path particle dosimetry model was used to calculate deposition efficiencies of respired particles in the head, pulmonary, and tracheobronchial regions of the respiratory tract (Fig. S14). An inhalation rate of 0.01 m3 min−1 was assumed for an upright adult at rest. The total number of respired particles was determined by multiplying the total particle number concentration size distribution, measured when total particle number concentrations were at maximum value while GUV222 was on, by the size-dependent deposition efficiencies and then integrating across the particle size range.

Results and Discussion

GUV222 generates O3 and O3 chemistry byproducts in a restroom

We summarize the O3 generation and chemistry leading to VOC and aerosol byproduct formation from GUV222 operation in Fig. 2. We express O3 and VOC concentrations in parts-per-billion (ppb) defined as the number density (molecules cm−3) of O3 or a VOC divided by the air number density (≈ 2.43 x 1019 molecules cm−3 at Standard Ambient Temperature and Pressure). For every oxygen molecule that is photolyzed by 222nm radiation, two ground-state oxygen atoms are formed, O(P3), that then combine with molecular oxygen (in a termolecular reaction with a collisional body, M) to form two molecules of O316, 17, 29.

Fig. 2. Chemical processes promoted by GUV222 leading to O3 chemistry byproducts in the restroom.

Fig. 2.

Urinal screens (pink) are the primary source of gas-phase reactive precursor VOCs in the restroom. Purple colors show O3 reactive loss mechanisms (VOCs, NO, and surfaces). VOCs react with O3 to form oxidized VOCs (VOCOx) that we categorize as either O3 oxidation VOC byproducts (VOCO3Ox) or gas-phase condensable VOCs (VOCcond,g). Green colors show VOCcond,g loss mechanisms. VOCcond,g can nucleate particles that then can undergo coagulation and condensation to form aerosol mass (Mp). VOCcond,g can directly condense on aerosol and surfaces. All species shown here are subject to removal or replenishment via air change.

O2+hv(λ=222nm)2O(P3) (R1)
2O(P3)+2O2+2M2O3+2M (R2)

Once O3 is generated by GUV222 it can undergo several fates including removal by air change as well as reactions with nitric oxide (NO), reactive VOCs (e.g., emissions from urinal screens in the case of this restroom study), and surfaces. NO can be introduced indoors via outdoor air infiltration35 and can react rapidly with O3. In many indoor spaces, reactive uptake of O3 to surfaces is a major loss process that can occur as rapidly as O3 removal via the ACR.22 On the other hand, the reaction of O3 with many gas-phase VOCs is too slow to be considered as a major O3 sink indoors unless there is a strong VOC emission source from human occupancy, consumer products, cooking, and/or cleaning.22

The reaction of GUV222-generated O3 with unsaturated VOCs can form OH that can then rapidly oxidize VOCs. Oxidized VOCs that are effectively unreactive with O3 in indoor spaces can also be oxidized by OH.16 Oxidation of VOCs by O3 and OH produce oxidized VOCs that we classify either as O3 VOC oxidation byproducts (VOCO3Ox) or gas-phase condensable VOCs (VOCcond,g). Detailed representations of VOC oxidation product volatility distributions exist36-38, but characterization of the distributions from chemistry in the restroom is beyond the scope of this study. VOC03Ox byproducts include chemicals like acetone, acetic acid, and aldehydes which we measured with our VOC instrumentation. VOCcond,g byproducts can partition to existing aerosol and increase aerosol mass concentrations (Mp). However, VOCcond,g can also partition to surfaces, including walls and restroom stalls. Given sufficiently low vapor pressures, VOCcond,g may also achieve supersaturation at low gas-phase concentrations and thus nucleate new particles upon formation of molecular clusters with other low-volatility VOCs, sulfuric acid, and/or ammonia.39 We had a limited ability to measure VOCcond,g with our instrumentation.

O3 and O3 chemistry byproducts were generated from GUV222 operation in the restroom during both weekends (shaded area under the curves in Fig. 3 and 4). GUV222 was operated for five three-hour on/off cycles during Wk1, and five four-hour cycles followed by four two-hour cycles during Wk2. The major driver of changes in indoor air chemistry from operation of GUV222 was production of O3. Production of O3 from GUV222 is discernible from non-GUV222 influences on O3 concentrations, like infiltration of hallway air to the restroom and titration of O3 by nitric oxide (NO; Fig. 3A and 4A). The average increase in the O3 concentration in Wk1, when GUV222 was on, was 4.0 ppb ± 1.1 ppb. The average increase in the O3 concentration in Wk2 when GUV222 was on was 5.8 ppb ± 1.2 ppb. After GUV222 was turned off, O3 concentrations in the restroom returned to background concentrations that vary as a function of the hallway O3 concentrations. Lower background O3 concentrations in the restroom, compared to the hallway, indicate considerable reactive O3 losses from reactions on surfaces and with gas-phase VOCs.

Fig. 3. Weekend 1 (Wk1) time series of O3, NO, and O3 chemistry byproducts.

Fig. 3.

The ACR in Wk1 was ≈ 1 h−1. Byproducts include O3 (purple), VOC O3 oxidation products (VOCO3Ox, black), particle number (Np, red), particle volume (Vp, green), and particle mass (Mp, green) concentrations. Pink shaded regions show when GUV222 was on. The striped, pink regions later in the weekend show shorter duration and more frequent GUV222 on/off cycling. Dotted lines indicate the 8-hour periods where a mixing fan was on. Shaded areas below the traces show the estimated increase in byproduct concentrations generated by GUV222. Hallway concentrations of VOC O3 oxidation products (VOCO3Ox) and O3 are used in O3 and VOCO3Ox generation rate calculations. (A) A decrease in O3 concentrations (dark purple for restroom and light purple for hallway) with increased NO (orange) concentrations is shown. (B) VOCO3Ox is the sum of 34 VOCs observed to increase in concentration when GUV222 was turned on. (C) The y-axis is Np divided by 1000. (D) Vp and Mp y-axis ranges are adjusted so the two traces are coincident.

Fig. 4. Weekend 2 (Wk2) time series of O3, NO, and O3 chemistry byproducts.

Fig. 4.

The ACR in Wk2 was ≈ 2 h−1. The descriptions in the caption for Fig. 3 apply to this figure also (note the y-axis scaling for particle number). A MERV-13 do-it-yourself (DIY) air cleaner was used for two GUV222 on/off cycles at the end of the weekend (teal dotted lines and dots).

We measured increases in VOC O3 oxidation products (VOCO3Ox) and particle number (Np), volume (Vp), and mass (Mp) concentrations (particle diameter from 10 nm to 420 nm) from chemistry initiated by GUV222-generated O3. We expect the chemical composition of newly-formed aerosol to be mostly organic, resulting from terpenoid oxidation by O3 in the restroom, and thus we multiply Vp by a density of 1.32 g cm−3 (average density of terpene secondary organic aerosol)40 to quantify Mp. Higher concentrations of VOCO3Ox. (Fig. 3B and 4B), Np (Fig. 3C and 4C), and Mp (Fig. 3D and 4D) were formed from GUV222 in Wk1, under conditions of lower (≈ 1 h−1) ventilation, versus Wk2, when the ACR was higher (≈ 2 h−1).

During both weekends, Np initially peaks to a maximum value after turning on GUV222 and then decreases to steady-state concentrations for the duration of the on cycle, unless the mixing fan was operating. In Wk2 when the mixing fan was operating we did not observe a discernible increase in Np during GUV222 operation compared to background Np variation. Steady-state production of Mp in Wk1 was achieved approximately an hour after turning on GUV222 regardless of if the mixing fan was operating. Average Mp produced from GUV222 during Wk1 was 1.8 μg m−3 ± 0.7 μg m−3 with a maximum observed value of 2.6 μg m−3. We note that in Wk2, an increase in Mp was observed for approximately 10 hours (starting at t = 14 hours until t = 24 hours), but we hypothesize infiltration of aerosol from the hallway was the source of the increase in Mp. We only measured aerosol in the restroom and thus could not constrain the influence of infiltration on Np or Mp with a simultaneous measurement of hallway concentrations.

We observed some effects on particle formation with use of a mixing fan and from using short duration high frequency on/off cycling of the lamps. The impacts MERV-13 DIY air cleaner use on Np and Mp formation from GUV222 are not clear from our two tests and we will not discuss them here. Increasing the air mixing with the use of a fan suppressed increases in Np in Wk2 (Fig. S5 and Fig. S6) that were observed when the mixing fan was not used and GUV222 was on. We did not observe a suppression of new particle formation when the fan was on in Wk1. However, in Wk1 we observed decreases in Np when the mixing fan was first turned on and while the fan was on during GUV222 on cycles suggesting Np loss was enhanced by increased rates of coagulation or deposition to walls with fan mixing. We hypothesize fan mixing increased the loss of small particles (which otherwise would coagulate and serve as condensation nuclei) to walls in Wk2 thereby suppressing new particle growth. Recently, fan mixing prevented the growth of newly-formed particles < 3 nm to larger sizes in a chamber where occupants were exposed to O341. Continued research into the influence of air mixing on particle formation dynamics from O3 reactions is warranted.

One potential application of GUV222 in a restroom is on/off cycling that is dependent on if an occupant is using a restroom stall. For an indoor space, like a restroom, where occupants generally use the space for short periods of time, short duration high frequency applications may be appropriate—assuming pathogen deactivation is also efficient on this timescale. In Wk1 we employed an intermittent use scheme where GUV222 was cycled on for two minutes and off for five minutes for an hour (on 16 min h−1) and on for five minutes and off for 15 minutes for three hours (on 20 min h−1). The shorter duration cycle produced less byproducts (including O3) compared to the longer duration cycle. The longer cycles resulted in measurable increases in VOCO3Ox, Np, and Mp. Our results indicate that intermittent use schemes may reduce byproduct formation from GUV222 compared to sustained periods of illumination but will not eliminate undesirable byproduct formation. Additionally, if we were to extend the total time the on/off cycling occurred, a buildup of byproducts may occur at low ventilation rates.

In the following sections we relate the reactive sinks of O3 to the production of VOC byproducts—some of which go on to form aerosol byproducts.

Apportionment of O3 reactive loss

Fig. 5A shows the kO3removal determined from modeling of restroom O3 concentrations. Although average measured kO3removal for Wk1 (4.8 h−1) and Wk2 (4.4 h−1) were within 10 %, O3 kloss,VOC was five times higher in Wk1 (1.5 h−1) compared to Wk2 (0.3 h−1). The amount of O3 lost to gas-phase reactions with VOCs in Wk2 decreased because initial reactive VOC concentrations measured in the restroom decreased by approximately a factor of four from Wk1 to Wk2. kloss,surface was constant between the two weekends when the fan was off (Wk1 = 1.5 h−1 and Wk2 = 1.7 h−1), but use of the mixing fan in Wk2 increased kloss,surface by 40 % (2.4 h−1). Mixing fan use only increased kloss,surface in Wk1 from 1.5 h−1 to 1.6 h−1. For simplicity, we only present and discuss O3 removal results from when the mixing fan was off.

Fig. 5. O3 removal rate constants and O3 removal apportionment.

Fig. 5.

(A) Average of measured O3 total removal rate constants (kO3removal) for each GUV222 on/off cycle, when the mixing fan was off, for each weekend apportioned by the contributing sinks. The error bars show the standard deviation of the total kO3removal averages. The apportionment of the O3 total removal rate constant attributed to ACR, NO, surface, and VOC loss are highlighted by varying colors. (B) Calculated steady-state O3 concentrations either present in the gas-phase ([O3]gas-phase) or consumed by a reaction when GUV222 was on and when GUV222 was off. The assumed source of O3 when GUV222 is off is passive flow from the hallway. GUV222 on indicates source contributions from the hallway plus generation from the GUV222 lamps.

Assuming steady-state (i.e., t → ∞), and using Equation 1, we calculated how much O3 we expect to see in the gas-phase in the restroom, where GUV222 is off and O3 from the hallway is the only source (i.e., GRO3=0 μg h−1 lamp−1), compared to when GUV222 is on (peach bars in Fig. 5B). The sum of the O3 concentrations lost to NO, surfaces, and VOCs at steady-state (sum of green, light gray, and blue bars in Fig. 5B) when GUV222 is off is the background O3 reactive loss ([O3]reactive loss,GUV222OFF). Similarly, because a new source of O3 is present in the restroom, when GUV222 is on (i.e., GRO3=930 μg h−1 lamp−1) the sum of O3 concentrations lost to NO, surfaces, and VOCs at steady-state is the total O3 reactive loss from both background and GUV222-generated O3 ([O3]reactive loss,GUV222ON). Consequently, the increased concentration of O3 lost to gas-phase and surface reactions from GUV222 compared to background (Δ[O3]loss,GUV222) can be expressed as,

Δ[O3]loss.GUV222=[O3]reactive loss.GUV222 ON[O3]reactive loss.GUV222 OFF (6)

Additionally, we can determine the relative amount of O3 reactive loss (Δ[O3]loss,GUV222,sink) to each reactive sink (reactions with NO, VOCs, and surfaces), fO3,reactivesink, via Equations 7 and 8,

fO3,reactive sink=kloss,reactive sinkkO3loss (7)
Δ[O3]loss.GUV222.sink=Δ[O3]loss.GUV222fO3.reactive sink (8)

For both weekends the amount of O3 measured in the gas-phase is only a fraction of the O3 that is lost to VOC and surface reactions. The amount of O3 reactive loss increases by almost a factor of three for WK1 and almost a factor of two for Wk2 compared to the amount lost under background conditions. This indicates that the GUV222 is enhancing indoor chemistry by at least a factor of two for this space. The extent of this enhanced chemistry will likely be different for different indoor spaces as it is dependent upon ventilation rates, species and concentrations of precursor VOCs, and surface reactivity.

In the following sections we use Δ[O3]loss,GUV222 to quantify yields of byproducts from GUV222-generated O3. We do not expect aerosol or VOC byproducts to be formed from NO reactive O3 loss and thus we only use the fraction of Δ[O3]loss,GUV222 that can be attributed to gas-phase and surface loss of O3.

Generation of VOC O3 oxidation byproducts from GUV222

We quantified 34 VOC oxidation byproducts (VOCO3Ox) that increased in concentration when GUV222 was on during both weekends (Fig. 6A). We categorized the 34 VOCO3Ox into lumped species of aldehydes, terpenoid oxidation products, and other oxidized VOCs. Several saturated aldehydes that are commonly reported in the literature to be produced from oxidation of monoterpenes by O3 were generated while GUV222 was on. These include formaldehyde, acetaldehyde, and hexanal. We categorized a suite of structurally ambiguous VOCO3Ox, many of which were composed of seven to ten carbon atoms, as likely terpenoid oxidation products. Previous reports of VOCO3Ox production from the O3 oxidation of ocimene42, 43 and other terpenes44 help inform our categorization of VOCO3Ox to terpenoid oxidation products (example mechanism shown in Fig. S13). VOCO3Ox that we lumped into the other oxidized VOC category have been reported to originate from both gas-phase oxidation of VOCs as well as surface oxidation processes. These include acetone, acetic acid, hydroxyacetone, and formic acid, among others (Table S1).

Fig. 6. VOCO3Ox concentrations, generation rates, and potential sources from GUV222-generated O3.

Fig. 6.

(A) Average time series of VOCO3Ox produced from GUV222 during Wk1 and Wk2. (B) Average and standard deviation of VOCO3Ox generation rates from GUV222 (GRVOC O3 Ox.,GUV222) for Wk1 and Wk2. (C) GRVOC O3 Ox.,GUV222 normalized to Δ[O3]loss,GUV222 with VOCs (blue), surfaces (gray), and VOCs + surfaces (black). Error bars represent the standard deviation propagated from the GRVOC O3 Ox.,GUV222 measurement.

VOCO3Ox are produced from background O3 chemistry as well as GUV222-generated O3 chemistry. To quantify how much VOCO3Ox is attributable to the increase in O3 chemistry from GUV222, above background, we calculate VOCO3Ox generation rates (GRVOCO3Ox). We assume negligible losses from reactions and partitioning (i.e., kloss=ACR) and thus the GRVOCO3Ox reported here may represent a lower bound and is specific to this space. Additionally, our reported values may be most biased to molecules with higher volatility that will not appreciably participate in surface portioning or reactive chemistry. We use the steady-state solution to Equation 1 shown below in Equation 9 to calculate (GRVOCO3Ox),

[VOCO3Ox.]restroom=GRVOCO3Ox.+ACR[VOCO3Ox.]hallwayACR (9)

where GRVOCO3Ox is expressed as a total generation rate (i.e., sum of three lamps) in ppb h−1. We determined GRVOCO3Ox by minimizing the difference between measured and calculated VOCO3Ox concentrations in the restroom.

We define a GRVOCO3Ox from GUV222 chemistry (GRVOCO3Ox.,GUV222) by subtracting a background source rate (GUV222 OFF) from the generation rate measured by GUV222 was on.

GRVOCO3Ox.GUV222=GRVOCO3Ox.GUV222 ONGRVOCO3Ox.GUV222 OFF (10)

We use the average hallway and restroom VOCO3Ox concentrations over a 30-minute period prior to when GUV222 was on for the “GUV222 OFF” calculation and over a 30-minute period two hours after the lamps were on for the “GUV222 ON” calculation.

Average GRVOCO3Ox.,GUV222 was slightly higher in Wk1 (9.1 ppb h−1 ± 2.7 ppb h−1) compared to Wk2 (5.8 ppb h−1 ± 3.0 ppb h−1). However, the variability in average GRVOCO3Ox.,GUV222 was approximately 30 % for Wk1 and > 50 % for Wk2 and demonstrates the challenge of quantifying VOCO3Ox production from GUV222 in this real environment. Two VOCO3Ox that comprised approximately half of the total GRVOCO3Ox.,GUV222 during both weekends were acetone and acetic acid. The GRVOCO3Ox.,GUV222 for terpenoid oxidation products decreased from 0.9 ppb−1 in Wk1 to 0.2 ppb h−1 in Wk2 likely due to a decreased gas-phase terpenoid oxidation source. Aldehyde GRs stayed nearly constant (≈ 2 ppb h−1) between the two weekends potentially pointing to differing contributions from both gas-phase and surface reactions of O3.

We investigate the potential sources of VOCO3Ox by normalizing the GRVOCO3Ox.,GUV222 by Δ[O3]loss,GUV222 from VOCs, surfaces, and the sum of VOCs and surfaces (Fig. 6C). This normalized generation rate is a way of investigating the potential VOCO3Ox sources in the restroom and is not generalizable to other spaces. Going from Wk1 to Wk2 the GRVOCO3Ox.,GUV222 normalized by Δ[O3]loss,GUV222,VOC increases from approximately 1 ppb ppb−1 to 14 ppb ppb−1 suggesting that, in order for the source of VOCO3Ox to be from O3 reactions with VOCs, the VOC source would have to produce 14 times more VOCO3Ox in Wk2 compared to Wk1. Thus, we do not think O3 reactions with gas-phase VOCs are the only source of VOCO3Ox for both weekends. The consistency of the GRVOCO3Ox.,GUV222 normalized to Δ[O3]loss,GUV222,surface suggests that surface reactions may be a stronger source of VOCO3Ox when GUV222 is operating. However, there was enough variability in measured GRVOCO3Ox.,GUV222 such that the source of VOCO3Ox could also reasonably be explained from a combination of surface and gas-phase O3 reactive loss.

VOCO3Ox can be formed from both reactions of O3 on surfaces and in the gas-phase. In particular, studies have noted the reactions of O3 on surfaces soiled with human skin flakes or oils to be productive sources of VOCO3Ox.45, 46 The absence of key O3 + skin oil oxidation products46, 47 from our measurements, like 6-methyl-5-hepten-2-one (6-MHO), geranyl acetone, and decanal, suggest that surface reactions of skin oils may not be a primary source of VOCO3Ox byproducts in the restroom. Although the gas-phase O3 reactivity was impacted by varying urinal screen emissions between the two weekends, restroom use and surface cleaning were consistent in the days prior to each weekend. Hence, surface reactions are more likely than gas-phase reactions to be consistent between the weekends.

Typically, in the absence of a strong reactive VOC source (e.g., human occupants, air fresheners, cleaning products, etc.), reactions of O3 with VOCs in the gas-phase are not thought to be a major source of VOCO3Ox in many indoor spaces.22 However, the correlation in reduction of VOCO3Ox generation rates with the reduction in gas-phase precursor chemicals indicates this restroom is a unique instance where gas-phase production of VOCO3Ox from GUV222-generated O3 is likely important. However, our data also suggest that partitioning of gas-phase VOC precursors to surfaces and/or direct application of terpenoid cleaning products to surfaces may also serve as a persistent source of VOCO3Ox from GUV222-generated O3. In fact, previous work has shown terpenoids to exhibit increased reactivity on surfaces, compared to gas-phase reactions48, 49 and also these reactions can generate ultrafine particles50.

Ultrafine particle formation from GUV222

The O3 produced from GUV222 generates ultrafine particles (i.e., particle diameter < 100 nm) from VOC oxidation during both weekends (Fig. 7A). New particle formation is the process where particles nucleate from condensable vapors then grow in size via condensation and coagulation. New particle formation is the process that drives the initial increase in particle number concentrations (Np), after GUV222 is on, in both Wk1 and Wk2. A maximum in Np (Max ΔNp) is reached after approximately 30 minutes since GUV222 lamps are turned on. After that, coagulation of the newly formed particles leads to a decrease in Np. Without active mixing (i.e., mixing fan off) Np reach steady-state after approximately two hours. During steady-state, Np are maintained through the formation of new particles that grow to maximum sizes which are limited by the rates of coagulation and condensation of VOC oxidation products to existing particles. Use of a fan affected Np by increasing the coagulation and deposition rates as indicated by the rapid decrease in Np, shown in Fig. 3C and 4C, immediately after the mixing fan is turned on. Additionally, we find in Wk2 with use of a mixing fan new particle formation is suppressed possibly from increased particle mixing that scavenges condensable vapors before they can achieve supersaturation and nucleate and/or enhanced deposition of vapors to surfaces.

Fig. 7. Np production from GVU222, average Max ΔNp, and background versus GUV2222-produced respired particle deposition.

Fig. 7.

(A) Np concentrations (top) for Wk1 and Wk2 and the corresponding size distributions (bottom, color gradients represent the log-normal Np distribution (dNdlogDp) and are different for Wk1 and Wk2). Time when GUV222 was on is indicated in the image plots by a white box. Max ΔNp is determined from the maximum measured Np when GUV222 is on minus the Np just prior to the on cycle. (B) Average Max ΔNp measured for both weekends. (C) Total number of deposited respired particles, assuming five minutes of breathing in the restroom, while Np was at the max fractioned by deposition zone in the respiratory tract including the head, pulmonary, and tracheobronchial zones. The amount of deposited particles when GUV222 is ON represents the increase in deposition during GUV222 operation and includes background contributions (gray).

In the restroom new particle formation is driven by the formation of condensable gas-phase VOCs (VOCcond,g) resulting from O3 oxidation of precursor VOCs, that will form molecular clusters which can then spontaneously condense at supersaturation51-53. Increases in Np occur more quickly (approximately 20 minutes) after GUV222 is turned on in Wk1 compared to Wk2 (approximately 45 minutes after GUV222 is turned on). We hypothesize that the longer delay in Np production in Wk2 is because less VOCcond,g is being formed as a result of less VOCs reacting with O3 which means it takes longer for VOCcond,g to achieve supersaturation in Wk2 and nucleate particles. On average, higher Np were generated at the beginning of the new particle formation events in Wk1 (≈ 11300 cm−3) compared to Wk2 (≈ 2600 cm−3) (Fig. 7B).

The Mp we measure in this study represent a subset (particle diameter between 10 nm and 420 nm) of particulate matter with a diameter of 2.5 μm or less (PM2.5). PM2.5 concentrations are the most-commonly used measurement to understand aerosol health effects54, but limited evidence also suggests exposure to ultrafine Np may be associated with aerosol-related health concerns55-57. We put Np generation measured in this study into a potential exposure context by estimating the number of ultrafine particles inhaled and deposited in the respiratory tract from an upright person breathing for five minutes in the restroom while Np are at a maximum (Fig. 7C). Using inhaled particle deposition efficiencies, calculated from a multiple-path particle dosimetry model (Fig. S14), we also fractionate the deposition of inhaled particles along the head, pulmonary, and tracheobronchial regions of the respiratory tract. When Np production from GUV222 is at a maximum during Wk1 the number of particles deposited in the respiratory tract increases by a factor of three compared to when GUV222 is off. In contrast to Wk1, almost an order of magnitude more respired particles generated by GUV222 are deposited compared to background levels in Wk2.

The total number of deposited particles generated when GUV222 is on in Wk2 is nearly identical to the deposited particles from background aerosol in Wk1 when there was no GUV222, and the ACR was lower with precursor concentrations higher. This result demonstrates a case where increasing ventilation to the restroom improved the background air quality, but turning on GUV222 increased Np and negated the air quality improvement created from increased ventilation. Additionally, this result demonstrates that O3 that originates from GUV222 sources can produce similar impacts on indoor air quality as O3 from non-GUV222 sources. New particle formation occurring at the higher ACR and lower precursor concentrations during Wk2 GUV222 operation suggests that increasing the ventilation rate (at least up to ≈ 2 h−1) in indoor spaces equipped with GUV222 may not eliminate exposure to byproducts.

Aerosol mass formation dynamics from GUV222-initiated O3 chemistry

Informed by our measurements of GUV222-initiated increases in Mp in Wk1, we propose a framework, based on O3 loss to reactions with VOCs and equilibrium partitioning, for estimating a range of potential Mp production from GUV222 in the restroom. Mp production from GUV222 (ΔMp) can be predicted using Equation 11,

ΔMp=Δ[O3]loss,GUV222,VOCYMp (11)

where GUV222-generated O3 will react with gas-phase VOC precursors (Δ[O3]loss,GUV222,VOC) and produce a characteristic yield of Mp (YMp).

We assume gas-phase VOC oxidation by O3 (including any subsequent oxidation from OH) is the chemical mechanism for Mp formation from GUV222 chemistry:

O3+VOCγVOCcond,gMpVOCcond,p (R3)

where O3 will react with a VOC producing a stoichiometric mass yield, γ, of VOCcond,g that can then condense (VOCcond,p) to Mp that is present in the restroom prior to GUV222 operation. The value of γ is dependent on the identity of the precursor VOC, but here γ represents the effective yield of VOCcond,g from the lumped reactive VOCs present in the restroom. We lump both low-volatility and semi-volatile VOCs into a single product, VOCcond,g, that will condense to aerosol via equilibrium partitioning58.

Only the fraction of VOCcond,g that condenses to aerosol (fcond,p), as opposed to being lost to air change (kACR) or condensation to walls (kcond,w), will form Mp.

fcond,p=kcond,pkcond,p+kcond,w+ACR (12)

We calculate the condensation rate constant for VOCcond,g to aerosol (kcond,p) from the aerosol condensation sink (the integral in Equation 13) to determine how much VOCcond,g will condense to aerosol in the restroom (as opposed to being lost to air change or condensing to walls)59,

kcond,p=4πDgrβ(r)Np(r)dr (13)

where Dg is the gas diffusion coefficient of a terpenoid oxidation product with a molecular weight of 200 g mol−1 (Dg=7.0 x 10−6 m2 s−1)60, r is the particle radius (m), and β is the Fuchs–Sutugin correction for gas diffusion to a particle surface in the transition regime. The integral is determined for the Np size distribution from 10 nm to 420 nm discretized across 100 size bins. We used the Np size distribution measured at steady-state for this calculation. A discussion of the VOCcond,g wall loss calculation for kcond,w is included in the Supplementary Materials (Section S9).

We use a single-product organic aerosol equilibrium partitioning model61 that accounts for the competitive loss of condensable vapors to air change or walls compared to condensation, to determine the aerosol mass yield (YMp) as a function of fcond,p and pre-existing aerosol mass concentrations (Mp);

YMp=γ(KpMpfcond,p1+KpMpfcond,p) (14)

where Kp is a partitioning coefficient representing VOCcond,g equilibrium between the gas-phase and absorbing aerosol mass, and γ is the mass yield of VOCcond,g from the VOC precursors in the restroom. γ and Kp are determined from the fitting of YMp to fcond,p from Wk1 data using Equation 14. Although it is unlikely true equilibrium of VOCcond,g with Mp was achieved while GUV222 was on, the dependence of Mp production on background aerosol mass concentrations suggests equilibrium partitioning is an appropriate first-approximation for understanding the potential for Mp production from GUV222 chemistry in the restroom.

We calculate YMp measured in Wk1 from the increase in Mp (ΔMp), while GUV222 is on, per ppb of O3 generated from GUV222 that is lost to reactions with VOCs (Δ[O3]loss,GUV222,VOC). YMp in the restroom can be expressed following Equation 1558, 62,

YMp=ΔMpΔVOC=ΔMpΔ[O3]loss,GUV222,VOC (15)

where ΔMp is the Mp (μg m−3) produced at steady-state while GUV222 is on and ΔVOC is the concentration of the reactive VOCs (μg m−3) consumed.

A higher amount of O3 reacting with VOCs in Wk1 (Fig. 8A) created more VOCcond,g than in Wk2. Wk1 VOCcond,g condensed to aerosol to a greater extent than Wk2, in part, because of a higher background condensation sink (i.e., a higher fcond,p, Fig. 8B). In Wk1, on average, approximately 10 % of VOCcond,g generated by GUV222 were condensing to aerosol whereas in Wk2 only 2 % condensed to aerosol. We expect that reactions of O3 that entered the restroom from the hallway were the source of background aerosol number concentrations that served as the condensation sink for GUV222-generated VOCcond,g. Because of decreasing emissions of reactive VOCs from the urinal screen in Wk2, background O3 reactions resulted in lower background aerosol number and mass concentrations compared to Wk1. However, varying levels of aerosol entering the restroom from the hallway could also impact the condensation sink. Ultimately, these lower aerosol concentrations lead to a diminished fcond,p in Wk2 compared to Wk1.

Fig. 8. Prediction of ΔMp from GUV222 chemistry as a function of Δ[O3]loss,GUV222,VOC, background aerosol concentrations (Mp), and fcond,p.

Fig. 8.

(A) Average and standard deviation of O3 generated from GUV222 that is lost to VOCs (Δ[O3]loss,GUV222,VOC) at steady-state for Wk1 and Wk2. (B) Fractional contributions of the VOCcond,g losses (ACR, condensation to surfaces, and condensation to aerosol) to calculated VOCcond,g total loss. (C) Determination of Mp yield (YMp) as a function of fcond,p from fitting a partitioning model (red) to YMp measurements in Wk1. The stoichiometric mass yield, γ, is 0.34 and Kp is 8.77 m3 μg−1 of Mp (D) This graph is generated by using the γ and Kp values determined from the fitting of Wk1 data in panel (C) and solving Equation 14 for various fcond,pMp to determine YMp and then using the calculated YMp value and various Δ[O3]loss,GUV222VOC to solve Equation 11 for ΔMp. Dashed lines show the combinations of Δ[O3]loss,GUV222,VOC and fcond,pMp that produce a given concentration of ΔMp. The red markers show the average and standard deviation of Δ[O3]loss,GUV222,VOC and fcond,pMp values for Wk1 and Wk2.

We propose the relationship between Δ[O3]loss,GUV222,VOC and the product of fcond and Mp (fcond,pMp) is a more useful predictor of potential Mp formation from GUV222 chemistry than the ACR. The role of the ACR in potential aerosol byproduct formation is dynamic as the ACR simultaneously regulates steady-state concentrations of reactive VOC precursors, timescales for gas-to-particle partitioning, and introduction of infiltrated O3. For instance, increasing the ACR can decrease steady-state concentrations of reactive VOCs from the urinal screens and affect the particle concentration in the restroom from mixing with hallway air. Increasing the ACR can also affect the amount of O3 reacting with surfaces and VOCs by increasing the hallway O3 source supplied to the restroom. Regardless of what the ACR is, the amount of O3 that reacts with VOCs to produce VOCcond,g (Δ[O3]loss,GUV222,VOC) and the relative strength of the condensation sink (fcond,p) will determine what concentrations of aerosol mass can be generated from GUV222 at steady-state.

Using our Wk1 measurements of Mp generated from GUV222 (ΔMp) and corresponding values of Δ[O3]loss,GUV222,VOC we calculated YMp. We then fit YMp to fcond,pMp using an equilibrium partitioning model shown by Equation 14 (Fig. 8C). We then predicted ΔMp in Wk2 from measurements of fcond,pMp (to predict YMp) and Δ[O3]loss,GUV222,VOC using Equation 11.

The combined effect of both decreased O3 reactions (Δ[O3]loss,GUV222,VOC<1ppb) and VOC loss via condensation (fcond,pMp<0.2) explain the lack of measurable GUV222-generated Mp in Wk2 (Fig. 8D). The predicted steady-state Mp concentrations for Wk2 were less than 0.20 μg m−3 for the seven GUV222 on/off cycles. We estimate the minimum detectable change in Mp concentration (measured as three times the standard deviation of background Mp concentrations by the scanning mobility particle sizer) to be 0.15 μg m−3 and thus we could not confidently detect Mp formation (largest predicted Mp formation = 0.17 μg m−3) from GUV222 operation in Wk2. Fig. 8D shows that a relatively high amount of O3 reactivity is needed (e.g., > 2 h−1 in this study, γ and Kp values may be different in other environments) to produce more than 3.0 μg m−3 at steady-state in the restroom. While fcond,p and background Mp are important in potentiating Mp formation, the O3 reactivity and characteristic VOCcond,g yield from reactive VOC precursors will limit maximum Mp production. Our calculations indicate that in Wk2 even if an infiltration source of aerosol were to increase Np such that fcond,p was similar to Wk1, less than 0.25 μg m−3 of Mp would be generated from GUV222-initiated O3 chemistry.

While previous work has comprehensively evaluated the relationship between indoor pollutant concentrations and the air change rate63, generation of ultrafine particles from chemical reactions of terpenoids64, and organic aerosol formation from partitioning of condensable gases to aerosol65, we find that organic aerosol formation indoors is also regulated by the dynamic loss of condensable vapors to surfaces. The framework for predicting Mp formation from GUV222 chemistry we present here treats the loss of VOCcond to surfaces in a simplified way compared to other sophisticated modeling studies that have evaluated surface partitioning of semi-volatile VOCs by quantifying loss rates from deposition velocities and air-octanol partitioning coefficients36 as well as other approaches that determine loss rates as a function of vapor pressure66. Future work should focus on understanding how condensable vapor loss varies between indoor environments, where the ventilation and background air quality can be different, and how that can impact aerosol formation from indoor chemistry.

Conclusions

The ACR was not the most important predictor of byproduct formation from GUV222 in our study and may not be a predictive metric for potential byproduct formation from GUV222 in other indoor spaces. Because byproduct formation is driven by O3 chemistry, O3 reactive loss was a better predictor of byproduct formation than ACR in the restroom. In fact, the ACR contributed to less than half of total O3 removal rate for both weekends. In Wk1, when more O3 was lost to reactions with VOCs, compared to Wk2, we measured higher concentrations of gas-phase and aerosol byproducts from GUV222 operation. Thus, O3 reactive loss rates were a better indicator than the ACR of the potential for byproduct-forming chemistry from GUV222.

When trying to predict health-impacting aerosol mass (Mp) generation from GUV222 it is important to understand how likely it is that condensing gases produced from O3 reactions with reactive VOCs (VOCcond,g) will condense to pre-existing aerosol versus being lost to air change or condensation to walls. The predictive calculations of Mp production in Fig. 8 are specific to the O3 reactivity profile of the restroom. In other words, different precursor VOCs can generate higher or lower yields of VOCcond,g that will condense to aerosol than what we measured in this study. Terpenoids were a major source of reactive VOCs for byproduct formation from GUV222-initiated O3 chemistry in the restroom. In a simplified calculation incorporating secondary organic aerosol yields measured in laboratory studies44, 67, 68, we estimate that > 95 % of the Mp produced from GUV222 measured in Wk1 was from O3 oxidation of α-terpinene (Fig. S15). α-Terpinene is the most O3 reactive terpenoid (kO3+αterpinene=8.7 x 10−15 cm3 molecule−1 s−1) and has a high organic aerosol yield (0.5 μg m−3 of aerosol per 1 μg m−3 of reacted α-terpinene). Identifying spaces with key O3 reactive precursors that can affect indoor air quality, like α-terpinene, can help in identifying spaces where GUV222 installations may be problematic. Additionally, labeling products with fragrance formulations could help inform consumers who want to decrease the indoor air quality impacts of terpenoid oxidation by O3.

Our method of calculating indoor space-specific aerosol yields (YMp) from GUV222-initiated O3 chemistry considers how much condensable gases are lost to air change and surface reactions versus condensation to aerosol. In practice we have shown that if the ACR, size-dependent particle concentrations, and O3 reactive loss rates can be measured then the partitioning framework presented in this study could be used to estimate potential Mp formation from GUV222 in other indoor spaces. The YMp we measured is characteristic for the reactive terpenoid precursors in the restroom but will likely be different in indoor spaces with different reactive precursors. Further work modeling and measuring the impact of vapor-wall loss on aerosol formation from chemical reactions indoors would be helpful in further understanding the potential of GUV222 chemistry to generate aerosol pollution in chemically diverse indoor environments.

We have demonstrated that O3 and O3 chemistry byproduct formation can occur from operation of GUV222 in a restroom. Because the air composition in public spaces, like museums69, offices, recreation centers70, 71, and classrooms72, 73, is considerably diverse74 other field studies of air quality impacts of GUV222 are warranted. Deposition of GUV222-generated O3 to human occupants is expected to be the most important loss process in a densely occupied indoor space75. O3 reactions in occupied spaces have been observed to produce oxidized VOC byproducts45, 76, OH77, and aerosol78. Indoor air quality impacts from GUV222 are thus likely to be modulated by human occupancy. Our measurements of VOCO3Ox from an unoccupied restroom only capture a subset of the VOC byproducts likely produced from GUV222-initiated chemistry. Multiple simultaneous real-time mass spectrometry measurements have been shown to be useful in capturing the range of possible oxidation products produced in the continuum that exists between reactive VOC precursor and condensed-phase organics73, 79, 80 and would be informative for GUV222 air quality studies. Measurements of enhanced surface oxidation by GUV222-generated O3 and direct irradiation from 222nm light are also warranted.

When installed in the restroom, which represented a real-world application, GUV222 produced O3 at concentrations significant enough to induce chemistry resulting in the formation of VOC and aerosol byproducts. Research has highlighted the association of chronic exposure to low levels of PM2.5 in outdoor air to excess mortality54, 81, 82 and thus potential generation of Mp, and the associated exposure risk, by GUV222 should be considered in an assessment of the technology to improve public health. Further research is needed to evaluate indoor air quality implications of GUV222 in a variety of indoor spaces to inform operational guidance. Specifically, the influences of occupancy on air chemistry initiated by GUV222 could affect byproduct formation in ways not captured by our study of an unoccupied restroom.

Supplementary Material

Supp1

Acknowledgements

We thank the staff of NIST building 226 for accommodating the deployment of instrumentation for this study as well as NIST custodial services for providing urinal screens for measurements. We thank Jose Jimenez, Charlie Weschler, Glenn Morrison, Zhe Peng, and Shantanu Jathar for helpful discussions. We thank Kirsten Koehler for use of an electrostatic classifier and differential mobility analyzer. We thank Katherine Ratliff at the EPA for use of the GUV222 devices.

Footnotes

Electronic Supplementary Information (ESI) available: [details of any supplementary information available should be included here]. See DOI: 10.1039/x0xx00000x

Conflicts of interest

There are no conflicts to declare.

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