This is a correction to: Stephen K. Godin, Zhuying Zhang, Benjamin W. Herken, James W. Westmoreland, Alison G. Lee, Michael J. Mihalevic, Zhongxun Yu, Robert W. Sobol, Michael A. Resnick, Kara A. Bernstein, The Shu complex promotes error-free tolerance of alkylation-induced base excision repair products, Nucleic Acids Research, Volume 44, Issue 17, 30 September 2016, Pages 8199–8215, https://doi.org/10.1093/nar/gkw535
In June 2025, the Editors were alerted to a potential duplication of the YPD plate image in Fig. 1, panels C and E. Upon review, the authors confirmed that the images are indeed identical. They explained that, due to space constraints in panel C, the 50 μg/ml CPT plate was moved to panel E, and the YPD plate—serving as a control—was duplicated across both panels.
The authors acknowledge that this duplication should have been disclosed in the original figure legend and have provided the following revised caption:
Figure 1. Schematic of base excision repair (BER) and the Shu complex primary sensitivity to methylmethane sulfonate (MMS) induced DNA damage. (A) Cartoon of BER pathway adapted from (51). The black arrows indicate the major pathway. (B) The indicated strains were 5-fold serially diluted onto YPD medium, YPD medium containing 0.006% or 0.02% MMS, SC medium or SC medium containing 40 μg/ml cisplatin. The plates were incubated for two days at 30°C and photographed. (C) Same as (B) except that the YPD plate was exposed to 70 Gray ionizing radiation (IR) or 50 J/m2 ultra-violet (UV), or contained 100 mM hydroxyurea (HU) or 3 mM H2O2. (D) Same as (B) except that 2 mM etoposide was added to the YPD medium. (E) Same as (B) except that 50 μg/ml CPT was added to the YPD medium. The YPD plate shown is identical to the YPD plate in panel (C).
This correction does not affect the results, discussion, or conclusions of the article. To preserve the published version of record, these details have been corrected only in this notice.