Author Correction: Mechanically reliable and electronically uniform monolayer MoS₂ by passivation and defect healing

Correction to: Nature Communications 10.1038/s41467-025-62370-0, published online 2 August 2025

In the version of the article initially published, the “SiO₂” label in Fig. 2c should have read “Au/Ti/SiO₂/Si”. In the caption of Fig. 4, the text “Scale bars, Fourier transforms in (a, b), 2 nm⁻¹” should have read “Scale bars, Fourier transforms in (a, b), 2.5 nm⁻¹.” In the “Monolayer MoS₂ sample preparation” section of the Methods, the text “Holes of 2 μm in diameter and 500 nm in depth” should have read “Holes of 2 μm in diameter and ~1.5 μm in depth.” In the “AFM” section of the Methods, the text “signaled by large (>100 nm)” should have read “signaled by large (>1 μm)”. In the “Weibull statistical analysis” section of the Methods, the text “Plot the data in the form of ln[-ln(1-P)] versus ln(t)” should have read “Plot the data in the form of ln[-ln(1-P)] versus ln(σ) or (vs lnt)”. These corrections have now been made to the HTML and PDF versions of the article.