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. 1993 Dec;103(4):1097–1106. doi: 10.1104/pp.103.4.1097

Developmental Variability of Photooxidative Stress Tolerance in Paraquat-Resistant Conyza.

Z Amsellem 1, MAK Jansen 1, ARJ Driesenaar 1, J Gressel 1
PMCID: PMC159094  PMID: 12232004

Abstract

Paraquat-resistant hairy fleabane (Conyza bonariensis L. Cronq.) has been extensively studied, with some contention. A single, dominant gene pleiotropically controls levels of oxidant-detoxifying enzymes and tolerance to many photooxidants, to photoinhibition, and possibly to other stresses. The weed forms a rosette on humid short days and flowers in dry long days and, thus, needs plasticity to photooxidant stresses. In a series of four experiments over 20 months, the resistant and susceptible biotypes were cultured in constant 10-h low-light short days at 25[deg]C. Resistance was measured as recovery from paraquat. The concentration required to achieve 50% inhibition of the resistant biotype was about 30 times that of the susceptible one just after germination, increased to >300 times that of the susceptibles at 10 weeks of growth, and then decreased to 20-fold, remaining constant except for a brief increase while bolting. Resistance increased when plants were induced to flower by long days. The levels of plastid superoxide dismutase and of glutathione reductase were generally highest in resistant plants compared to those of the susceptibles at the times of highest paraquat resistance, but they were imperceptibly different from the susceptible type at the times of lower paraquat resistance. Photoinhibition tolerance measured as quantum yield of oxygen evolution at ambient temperatures was highest when the relative amounts of enzymes were highest in the resistant biotype. Resistance to photoinhibition was not detected by chlorophyll a fluorescence. Enzyme levels, photoinhibition tolerance, and paraquat resistance all increased during flowering in both biotypes. Imperceptibly small increases in enzyme levels would be needed for 20-fold resistance, based on the moderate enzyme increases correlated with 300-fold resistance. Thus, it is feasible that either these enzymes play a role in the first line of defense against photooxidants, or another, yet unknown mechanism(s) facilitate(s) the lower level of resistance, or the enzymes and unknown mechanisms act together.

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Selected References

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