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. Author manuscript; available in PMC: 2011 Jan 11.
Published in final edited form as: Nanotechnology. 2010 Aug 12;21(36):365302. doi: 10.1088/0957-4484/21/36/365302

Figure 5.

Figure 5

(a) – (c) SEM images at each deposition step; (a) bare, (b) 5 W biased Cr, and (c) SiO2 deposited tip. The Cr and SiO2 deposition times were 7 and 2 min, which corresponded to 12.2 nm and 255 nm, respectively. (d) – (f) SEM images during different stages of the FEBIE process. (g) – (i) SEM images for the final etched tip; (g) top, (h) 45° tilt, and (i) 90° rotation view.