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(a) Fabrication of gradient platforms with inverse line and space profiles. PS gratings were produced by NIL followed by annealing on a temperature gradient. Some PS gratings were subsequently used as a mold to form DMA gratings with the inverted pattern structure through photopolymerization. (b) Pattern height as a function of position (x) for PS and DMA grating platforms determined by AFM for Λ = 420 nm and 800 nm. Lines are drawn to guide the reader’s eyes.
