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. Author manuscript; available in PMC: 2013 Sep 4.
Published in final edited form as: Langmuir. 2012 Aug 23;28(35):12923–12929. doi: 10.1021/la302704t

Figure 2.

Figure 2

Profilometry traces revealing line and space cross-sections formed by 10 min orogenic growth of a COC surface masked with photoresist, using approximately 200 µm wide (a) positive (line) mask features and (b) negative (space) mask features. Narrow mask spaces exhibit larger growth than the field due to pile-up of polymer at the mask edges.