Skip to main content
PLOS One logoLink to PLOS One
. 2015 Feb 6;10(2):e0117875. doi: 10.1371/journal.pone.0117875

Correction: Preparation of High Purity Crystalline Silicon by Electro-Catalytic Reduction of Sodium Hexafluorosilicate with Sodium below 180°C

The PLOS ONE Staff
PMCID: PMC4320117  PMID: 25658715

There is an error in the third paragraph of the Introduction and the first equation. The 2 in Na2SiF6 should be subscripted. The correct sentence and the correct first equation are: The well-known Stanford Research Institute International (SRI) reduction process involves that purified silicon tetrafluoride (SiF4) gas through fractional distillation is reduced to silicon by metal sodium above 500°C. SiF4 is from the heat decomposition of sodium hexafluorosilicate (Na2SiF6) at 647°C:

Na2SiF6(s)=SiF4(g)+2NaF(s) (1)

In the Results and Discussion, there is an error in the third equation. The letter “P” was inadvertently added to the second value. Please view the complete, correct equation here:

4Na(s)+Na2SiF6(s)=Si(s)+6NaF(s) (3)

These errors were introduced during preparation of this manuscript for publication. The publisher apologizes for these errors.

Reference


Articles from PLoS ONE are provided here courtesy of PLOS

RESOURCES